Эта публикация цитируется в 4 статьях

Novel Photochemical Crosslinking Polymer Systems with High Sensitivity for Negative Resist Applications

A. V. Vannikov, A. D. Grishina, M. G. Tedoradze

A.N. Frumkin Institute of Electrochemistry, Russian Academy of Sciences, Moscow, Russian Federation

Аннотация: A process of both photochemical and thermally induced chemical amplification of the effect of primary light irradiation has been realized in the photochemical crosslinking of polyvinylethylal layers containing diphenylbenzylamine and hexabromodimethylsulphone, allowing us to obtain new highly sensitive photoresists.

Язык публикации: английский

DOI: 10.1070/MC1991v001n01ABEH000020

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