Эта публикация цитируется в 5 статьях

Dry Photochemical Etching of Metallic Films

A. V. Vannikov, A. D. Grishina, M. G. Tedoradze

A.N. Frumkin Institute of Electrochemistry, Russian Academy of Sciences, Moscow, Russian Federation

Аннотация: The illumination of a light sensitive polymer layer cast on top of a metallic film (Al or Bi) leads to etching of the metallic film; the light-sensitive layer consists of a polymer binder, including aromatic amines and hexabromodimethylsulfone; the additional use of an optical amplification process results in a new, dry, highly sensitive method of metallic film etching.

Язык публикации: английский

DOI: 10.1070/MC1992v002n02ABEH000135

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