Publications in Math-Net.Ru
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Rigorous model of multiwave exposure in optical lithography
Zhurnal Tekhnicheskoi Fiziki, 84:5 (2014), 113–118
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Integrated evaluation of diffraction image quality in optical lithography using the rigorous diffraction solution for a slot
Zhurnal Tekhnicheskoi Fiziki, 82:10 (2012), 65–71
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Polarization reversal of the wavefront of light beams in photorefractive crystals
Kvantovaya Elektronika, 13:4 (1986), 852–855
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Diffraction of light by phase holograms in photorefractive ferroelectric crystals
Kvantovaya Elektronika, 13:1 (1986), 147–158
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DYNAMIC TRANSFORMATION OF LIGHT-BEAMS IN ANISOTROPIC
FERROELECTRIC-CRYSTALS
Zhurnal Tekhnicheskoi Fiziki, 54:6 (1984), 1168–1173
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