Kiryukhin Yurii Borisovich

Publications in Math-Net.Ru

1. High-power EUV (13.5 nm) light source
   
   Kvantovaya Elektronika, 40:8 (2010),  720–726
2. Laser-induced extreme UV radiation sources for manufacturing next-generation integrated circuits
   
   Kvantovaya Elektronika, 39:10 (2009),  967–972
3. Theoretical and experimental investigations of the growth of a large-scale instability in the discharge of an XeCl laser with UV preionisation
   
   Kvantovaya Elektronika, 24:1 (1997),  25–30
4. Pulse-periodic 600-W XeCl laser for industrial applications
   
   Kvantovaya Elektronika, 18:2 (1991),  183–185
5. Pulse-periodic electric discharge XeCl laser
   
   Kvantovaya Elektronika, 17:2 (1990),  164–165
6. Conversion of λ = 308 nm radiation at pulse repetition frequencies up to 600 Hz by stimulated Raman scattering in compressed hydrogen
   
   Kvantovaya Elektronika, 15:10 (1988),  2030–2037
7. Divergence of radiation from an electric-discharge XeCl laser operating in the pulse-periodic regime
   
   Kvantovaya Elektronika, 15:9 (1988),  1712–1719
8. Wide-aperture electric discharge system with ultraviolet preionization for a pulse-periodic XeCl laser
   
   Kvantovaya Elektronika, 14:11 (1987),  2168–2174
9. Acoustic vibrations in the gas-discharge chamber of a fast-flow pulse-periodic laser
   
   Kvantovaya Elektronika, 14:6 (1987),  1206–1212
10. Output energy evolution effects in a pulse-periodic XeCl excimer laser with an average power of ~400 W
    
    Kvantovaya Elektronika, 14:5 (1987),  936–942
11. Electrode effects in a pulse-periodic excimer laser
    
    Kvantovaya Elektronika, 13:12 (1986),  2403–2407
12. Electron kinetics and acoustically induced inhomogeneities of the energy deposited in a pulse-periodic XeCl laser
    
    Kvantovaya Elektronika, 12:8 (1985),  1641–1649
13. Stimulated Raman scattering of radiation from an electric-discharge pulse-periodic XeCI laser in compressed H₂
    
    Kvantovaya Elektronika, 12:5 (1985),  1100–1102
14. Influence of electrode processes on the constriction of a volume discharge in pulse-periodic lasers
    
    Kvantovaya Elektronika, 12:5 (1985),  971–977
15. Establishment of a steady-state power level in a pulse-periodic excimer laser
    
    Kvantovaya Elektronika, 11:10 (1984),  2069–2073
16. Increase in the repetition frequency of XeCl laser pulses to 1 kHz
    
    Kvantovaya Elektronika, 11:4 (1984),  827–829
17. Reasons for the fall in the output power of a pulse-periodic XeCl laser during its operation
    
    Kvantovaya Elektronika, 10:11 (1983),  2336–2340
18. Pulse-periodic surface discharge
    
    Kvantovaya Elektronika, 10:10 (1983),  2110–2112
19. Effect of λ =308 nm laser radiation on pyrolysis of 1,2-dichloroethane
    
    Kvantovaya Elektronika, 10:7 (1983),  1406–1412
20. Characteristics of the pulse-periodic regime of excimer lasers
    
    Kvantovaya Elektronika, 10:3 (1983),  540–546
21. Optimization of the average power of pulsed-periodic KrF and XeCl excimer lasers
    
    Kvantovaya Elektronika, 8:9 (1981),  1909–1912
22. Excimer pulse-periodic laser
    
    Kvantovaya Elektronika, 7:4 (1980),  896–898
23. Changes in the characteristics of an electric-discharge XeF laser on increase in pressure
    
    Kvantovaya Elektronika, 5:10 (1978),  2285–2289
24. Free-oscillation stimulated emission from an electricdischarge CO₂ laser in the nanosecond range of pulse durations
    
    Kvantovaya Elektronika, 5:5 (1978),  1141–1143