Vinokhodov Aleksandr Yur'evich

Publications in Math-Net.Ru

1. Plasma-based sources of extreme ultraviolet radiation for lithography and mask inspection (50th anniversary of the Institute of Spectroscopy, Russian Academy of Sciences)
   
   UFN, 189:3 (2019),  323–334
2. High brightness EUV sources based on laser plasma at using droplet liquid metal target
   
   Kvantovaya Elektronika, 46:5 (2016),  473–480
3. High-brightness laser-induced EUV source based on tin plasma with an unlimited lifetime of electrodes
   
   Kvantovaya Elektronika, 46:1 (2016),  81–87
4. Formation of a fine-dispersed liquid-metal target under the action of femto- and picosecond laser pulses for a laser-plasma radiation source in the extreme ultraviolet range
   
   Kvantovaya Elektronika, 46:1 (2016),  23–28
5. 32.8-nm X-ray laser produced in a krypton cluster jet
   
   Kvantovaya Elektronika, 43:12 (2013),  1099–1106
6. High-power EUV (13.5 nm) light source
   
   Kvantovaya Elektronika, 40:8 (2010),  720–726
7. Laser-induced extreme UV radiation sources for manufacturing next-generation integrated circuits
   
   Kvantovaya Elektronika, 39:10 (2009),  967–972
8. On ultimate pulse repetition rates of an XeF laser
   
   Kvantovaya Elektronika, 30:10 (2000),  881–883
9. Development of high-power KrF lasers with a pulse repetition rate up to 5 kHz
   
   Kvantovaya Elektronika, 30:9 (2000),  783–786
10. Operational stability of a compact 600-W KrF laser
    
    Kvantovaya Elektronika, 25:2 (1998),  131–134
11. Compact 600-W KrF laser
    
    Kvantovaya Elektronika, 25:2 (1998),  126–130
12. Pumping rate of electric-discharge excimer lasers
    
    Kvantovaya Elektronika, 22:6 (1995),  533–536
13. Effects limiting the average power of compact pulse-periodic KrF lasers
    
    Kvantovaya Elektronika, 22:5 (1995),  446–450
14. Pulse-periodic 600-W XeCl laser for industrial applications
    
    Kvantovaya Elektronika, 18:2 (1991),  183–185
15. Pulse-periodic electric discharge XeCl laser
    
    Kvantovaya Elektronika, 17:2 (1990),  164–165
16. Conversion of λ = 308 nm radiation at pulse repetition frequencies up to 600 Hz by stimulated Raman scattering in compressed hydrogen
    
    Kvantovaya Elektronika, 15:10 (1988),  2030–2037
17. Divergence of radiation from an electric-discharge XeCl laser operating in the pulse-periodic regime
    
    Kvantovaya Elektronika, 15:9 (1988),  1712–1719
18. Wide-aperture electric discharge system with ultraviolet preionization for a pulse-periodic XeCl laser
    
    Kvantovaya Elektronika, 14:11 (1987),  2168–2174
19. Acoustic vibrations in the gas-discharge chamber of a fast-flow pulse-periodic laser
    
    Kvantovaya Elektronika, 14:6 (1987),  1206–1212
20. Output energy evolution effects in a pulse-periodic XeCl excimer laser with an average power of ~400 W
    
    Kvantovaya Elektronika, 14:5 (1987),  936–942
21. Electrode effects in a pulse-periodic excimer laser
    
    Kvantovaya Elektronika, 13:12 (1986),  2403–2407
22. Stimulated Raman scattering of radiation from an electric-discharge pulse-periodic XeCI laser in compressed H₂
    
    Kvantovaya Elektronika, 12:5 (1985),  1100–1102
23. Influence of electrode processes on the constriction of a volume discharge in pulse-periodic lasers
    
    Kvantovaya Elektronika, 12:5 (1985),  971–977
24. Establishment of a steady-state power level in a pulse-periodic excimer laser
    
    Kvantovaya Elektronika, 11:10 (1984),  2069–2073
25. Increase in the repetition frequency of XeCl laser pulses to 1 kHz
    
    Kvantovaya Elektronika, 11:4 (1984),  827–829
26. Reasons for the fall in the output power of a pulse-periodic XeCl laser during its operation
    
    Kvantovaya Elektronika, 10:11 (1983),  2336–2340
27. Characteristics of the pulse-periodic regime of excimer lasers
    
    Kvantovaya Elektronika, 10:3 (1983),  540–546