Borisov Vladimir Mikhailovich

Publications in Math-Net.Ru

1. High-brightness laser-induced EUV source based on tin plasma with an unlimited lifetime of electrodes
   
   Kvantovaya Elektronika, 46:1 (2016),  81–87
2. High-power, highly stable KrF laser with a 4-kHz pulse repetition rate
   
   Kvantovaya Elektronika, 45:8 (2015),  691–696
3. Prototype of a high-power, high-energy industrial XeCl laser
   
   Kvantovaya Elektronika, 45:3 (2015),  200–203
4. EUV light source with high brightness at 13.5 nm
   
   Kvantovaya Elektronika, 44:11 (2014),  1077–1082
5. High-power EUV (13.5 nm) light source
   
   Kvantovaya Elektronika, 40:8 (2010),  720–726
6. Laser-induced extreme UV radiation sources for manufacturing next-generation integrated circuits
   
   Kvantovaya Elektronika, 39:10 (2009),  967–972
7. On ultimate pulse repetition rates of an XeF laser
   
   Kvantovaya Elektronika, 30:10 (2000),  881–883
8. Development of high-power KrF lasers with a pulse repetition rate up to 5 kHz
   
   Kvantovaya Elektronika, 30:9 (2000),  783–786
9. Efficient preionisation in XeCl lasers
   
   Kvantovaya Elektronika, 26:3 (1999),  204–208
10. Powerful highly efficient KrF lamps excited by surface and barrier discharges
    
    Kvantovaya Elektronika, 25:4 (1998),  308–314
11. Operational stability of a compact 600-W KrF laser
    
    Kvantovaya Elektronika, 25:2 (1998),  131–134
12. Compact 600-W KrF laser
    
    Kvantovaya Elektronika, 25:2 (1998),  126–130
13. Theoretical and experimental investigations of the growth of a large-scale instability in the discharge of an XeCl laser with UV preionisation
    
    Kvantovaya Elektronika, 24:1 (1997),  25–30
14. Pumping rate of electric-discharge excimer lasers
    
    Kvantovaya Elektronika, 22:6 (1995),  533–536
15. Effects limiting the average power of compact pulse-periodic KrF lasers
    
    Kvantovaya Elektronika, 22:5 (1995),  446–450
16. Conditions for the excitation of a wide-aperture XeCl laser with an average output radiation power of 1 kW
    
    Kvantovaya Elektronika, 22:5 (1995),  433–435
17. Pulse-periodic 600-W XeCl laser for industrial applications
    
    Kvantovaya Elektronika, 18:2 (1991),  183–185
18. Interaction of pulse-periodic XeCl laser radiation with metals
    
    Kvantovaya Elektronika, 17:10 (1990),  1321–1326
19. Pulse-periodic electric discharge XeCl laser
    
    Kvantovaya Elektronika, 17:2 (1990),  164–165
20. Simple compact 10-J XeCl laser with double Blumlein pulse shaping line
    
    Kvantovaya Elektronika, 16:11 (1989),  2170–2172
21. Conversion of λ = 308 nm radiation at pulse repetition frequencies up to 600 Hz by stimulated Raman scattering in compressed hydrogen
    
    Kvantovaya Elektronika, 15:10 (1988),  2030–2037
22. Divergence of radiation from an electric-discharge XeCl laser operating in the pulse-periodic regime
    
    Kvantovaya Elektronika, 15:9 (1988),  1712–1719
23. Wide-aperture electric discharge system with ultraviolet preionization for a pulse-periodic XeCl laser
    
    Kvantovaya Elektronika, 14:11 (1987),  2168–2174
24. Wide-aperture electric-discharge XeCl laser with ultraviolet preionization and 20-J output energy
    
    Kvantovaya Elektronika, 14:8 (1987),  1542–1551
25. Acoustic vibrations in the gas-discharge chamber of a fast-flow pulse-periodic laser
    
    Kvantovaya Elektronika, 14:6 (1987),  1206–1212
26. Output energy evolution effects in a pulse-periodic XeCl excimer laser with an average power of ~400 W
    
    Kvantovaya Elektronika, 14:5 (1987),  936–942
27. Electrode effects in a pulse-periodic excimer laser
    
    Kvantovaya Elektronika, 13:12 (1986),  2403–2407
28. Instability of a uniform self-sustained discharge in excimer lasers
    
    TVT, 24:6 (1986),  1072–1078
29. Relationship between ionization processes and the geometric parameters of a pulsed discharge in helium
    
    Kvantovaya Elektronika, 12:11 (1985),  2317–2323
30. Electron kinetics and acoustically induced inhomogeneities of the energy deposited in a pulse-periodic XeCl laser
    
    Kvantovaya Elektronika, 12:8 (1985),  1641–1649
31. Fluorescence of $KrF^*$ in a volume discharge at the prebreakdown ionization multiplication stage
    
    Kvantovaya Elektronika, 12:6 (1985),  1311–1313
32. Laws governing the fluorescence of KrF* and XeF* excimer molecules in a volume discharge
    
    Kvantovaya Elektronika, 12:6 (1985),  1196–1203
33. Stimulated Raman scattering of radiation from an electric-discharge pulse-periodic XeCI laser in compressed H₂
    
    Kvantovaya Elektronika, 12:5 (1985),  1100–1102
34. Influence of electrode processes on the constriction of a volume discharge in pulse-periodic lasers
    
    Kvantovaya Elektronika, 12:5 (1985),  971–977
35. Establishment of a steady-state power level in a pulse-periodic excimer laser
    
    Kvantovaya Elektronika, 11:10 (1984),  2069–2073
36. Increase in the repetition frequency of XeCl laser pulses to 1 kHz
    
    Kvantovaya Elektronika, 11:4 (1984),  827–829
37. Study of the conditions of formation of a uniform high-current sliding discharge
    
    TVT, 22:4 (1984),  661–666
38. Reasons for the fall in the output power of a pulse-periodic XeCl laser during its operation
    
    Kvantovaya Elektronika, 10:11 (1983),  2336–2340
39. Pulse-periodic surface discharge
    
    Kvantovaya Elektronika, 10:10 (1983),  2110–2112
40. Effect of λ =308 nm laser radiation on pyrolysis of 1,2-dichloroethane
    
    Kvantovaya Elektronika, 10:7 (1983),  1406–1412
41. Hydrogen fluoride chemical laser initiated by a discharge creeping on the surface of a dielectric
    
    Kvantovaya Elektronika, 10:5 (1983),  1065–1067
42. Characteristics of the pulse-periodic regime of excimer lasers
    
    Kvantovaya Elektronika, 10:3 (1983),  540–546
43. A uniform high-current creeping discharge
    
    TVT, 21:5 (1983),  844–851
44. Experimental investigation of the characteristics of a planar surface discharge
    
    Kvantovaya Elektronika, 9:11 (1982),  2159–2167
45. Chemical HF laser initiated by an excimer XeCl laser
    
    Kvantovaya Elektronika, 9:2 (1982),  434–436
46. Xenon fluoride laser emitting 2-nsec pulses of near-diffraction-limited divergence
    
    Kvantovaya Elektronika, 8:10 (1981),  2271–2274
47. Optimization of the average power of pulsed-periodic KrF and XeCl excimer lasers
    
    Kvantovaya Elektronika, 8:9 (1981),  1909–1912
48. Control of the divergence and spectrum of an XeCl laser
    
    Kvantovaya Elektronika, 8:9 (1981),  1861–1866
49. Excimer electric-discharge laser with plasma electrodes
    
    Kvantovaya Elektronika, 8:1 (1981),  165–167
50. Use of a discharge over a dielectric surface for preionization in excimer lasers
    
    Kvantovaya Elektronika, 8:1 (1981),  77–82
51. Control of the spectral power of an $XeF$ laser
    
    Kvantovaya Elektronika, 7:6 (1980),  1375–1376
52. Excimer pulse-periodic laser
    
    Kvantovaya Elektronika, 7:4 (1980),  896–898
53. Changes in the characteristics of an electric-discharge XeF laser on increase in pressure
    
    Kvantovaya Elektronika, 5:10 (1978),  2285–2289
54. Free-oscillation stimulated emission from an electricdischarge CO₂ laser in the nanosecond range of pulse durations
    
    Kvantovaya Elektronika, 5:5 (1978),  1141–1143
55. Photoionization in pulse CO₂ laser
    
    Kvantovaya Elektronika, 4:4 (1977),  809–814
56. Influence of preionization on the discharge characteristics of a CO₂ laser
    
    Kvantovaya Elektronika, 3:11 (1976),  2460–2462
57. Changes in the parameters of a photoionization CO₂ laser on increase of pressure to 10 atm
    
    Kvantovaya Elektronika, 3:3 (1976),  651–653
58. Attainment of a homogeneous discharge in a large-volume pulse CO₂ laser
    
    Kvantovaya Elektronika, 2:9 (1975),  2086–2088
59. Amplfication of λ = 9.6 and 10.6 μ radiation
    
    Kvantovaya Elektronika, 2:4 (1975),  840–842