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Publications in Math-Net.Ru
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Double-mirror monochromator for the 4+ generation “SKIF” synchrotron light source
Zhurnal Tekhnicheskoi Fiziki, 95:10 (2025), 1963–1972
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Kirkpatrick–Baez focusing system for synchrotron applications
Zhurnal Tekhnicheskoi Fiziki, 95:10 (2025), 1954–1962
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Reconstruction of optical constants of thin films from laboratory reflectometers
Zhurnal Tekhnicheskoi Fiziki, 95:10 (2025), 1946–1953
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Structural and reflective characteristics of Cr/C multilayer mirrors synthesized by reactive sputtering method
Zhurnal Tekhnicheskoi Fiziki, 95:9 (2025), 1817–1824
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Multilayer NiMo/C structures fabricated by reactive magnetron sputtering
Zhurnal Tekhnicheskoi Fiziki, 95:9 (2025), 1808–1816
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Study of structural and reflective characteristics of multilayer X-ray mirrors based on a pair of Ru/B materials
Pisma v Zhurnal Tekhnicheskoi Fiziki, 51:1 (2025), 57–60
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Correlative extreme ultraviolet, ultraviolet and optical microscopy based on a specular microscope with axial tomography
Zhurnal Tekhnicheskoi Fiziki, 94:8 (2024), 1302–1313
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High-gradient aspherization of substrates with thin-film Al/Si coatings
Zhurnal Tekhnicheskoi Fiziki, 94:8 (2024), 1288–1294
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Ni-based multilayer structures for Goebel-type mirrors
Zhurnal Tekhnicheskoi Fiziki, 94:8 (2024), 1280–1287
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Study of the structural and reflective characteristics of short-period Mo/Be multilayer X-ray mirrors
Zhurnal Tekhnicheskoi Fiziki, 94:8 (2024), 1269–1279
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Boron based X-ray multilayer mirrors for the spectral range 6.7–9 nm
Zhurnal Tekhnicheskoi Fiziki, 94:8 (2024), 1260–1268
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Multilayer mirrors based on Cr/Ti for X-Ray microscopy in the “water window”
Zhurnal Tekhnicheskoi Fiziki, 94:8 (2024), 1250–1259
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Short-period multilayer mirrors for high-resolution multilayer mirror/crystal monochromator
Zhurnal Tekhnicheskoi Fiziki, 93:7 (2023), 943–947
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Investigation of the properties of multilayer mirrors based on a pair of materials Mo/B$_4$C
Zhurnal Tekhnicheskoi Fiziki, 93:7 (2023), 931–935
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Project of a two-mirror monochromator for the photon energy range 8–36 keV for the “SKIF” synchrotron
Zhurnal Tekhnicheskoi Fiziki, 92:8 (2022), 1261–1266
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Prospective wavelengths for projection lithography uing synchrotron radiation
Zhurnal Tekhnicheskoi Fiziki, 92:8 (2022), 1207–1212
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Ru/Sr multilayer mirrors for the spectral range 9–12 nm
Zhurnal Tekhnicheskoi Fiziki, 92:8 (2022), 1179–1184
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Research and creation of broadband X-ray mirrors with a spectral transmission band coinciding with emission lines and the possibility of filtering
Zhurnal Tekhnicheskoi Fiziki, 92:8 (2022), 1107–1112
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Manufacturing and research of mirrors with a wide bandwidth for synchrotron applications
Zhurnal Tekhnicheskoi Fiziki, 91:10 (2021), 1524–1531
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Measurements of the absolute values of the radiation intensity in the wavelength range of 6.6–32 nm of stainless steel targets with pulsed laser excitation
Zhurnal Tekhnicheskoi Fiziki, 91:10 (2021), 1448–1453
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Solar VUV telescope for nanosatellites
Zhurnal Tekhnicheskoi Fiziki, 91:10 (2021), 1441–1447
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Measurements of the absolute intensities of spectral lines of Kr, Ar, and O ions in the wavelength range of 10--18 nm under pulsed laser excitation
Kvantovaya Elektronika, 51:8 (2021), 700–707
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Multilayer Cr/Sc mirrors with improved reflection for the “water transparency window” range
Zhurnal Tekhnicheskoi Fiziki, 90:11 (2020), 1893–1897
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The microstructure of transition boundaries in multilayer Mo/Be systems
Zhurnal Tekhnicheskoi Fiziki, 90:11 (2020), 1884–1892
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Broadband mirrors for spectroheliographs at the KORTES sun study facility
Zhurnal Tekhnicheskoi Fiziki, 90:11 (2020), 1876–1883
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The smoothing effect of si layers in multilayer Be/Al mirrors for the 17- to 31-nm range
Zhurnal Tekhnicheskoi Fiziki, 90:11 (2020), 1870–1875
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Modification and polishing of the holographic diffraction grating grooves by a neutralized Ar ion beam
Zhurnal Tekhnicheskoi Fiziki, 90:11 (2020), 1864–1869
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Application of novel multilayer normal-incidence mirrors for euv solar spectroscopy
Zhurnal Tekhnicheskoi Fiziki, 90:11 (2020), 1817–1820
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Lasing efficiency of krypton ions in the (8–14)-nm band upon pulsed laser excitation
Kvantovaya Elektronika, 50:4 (2020), 408–413
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Features of multilayer mirror application for focusing and collimating X-rays from inverse Compton scattering sources
Kvantovaya Elektronika, 50:4 (2020), 401–407
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Diffraction limited X-ray optics: technology, metrology, applications
UFN, 190:1 (2020), 74–91
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Influence of thermal annealing on the properties of multilayer Mo/Be mirrors
Zhurnal Tekhnicheskoi Fiziki, 89:11 (2019), 1783–1788
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Influence of beryllium barrier layers on the properties of Mo/Si multilayer mirrors
Zhurnal Tekhnicheskoi Fiziki, 89:11 (2019), 1779–1782
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Multilayer Ag/Y mirrors for the spectral range of 9–11 nm
Zhurnal Tekhnicheskoi Fiziki, 89:11 (2019), 1774–1778
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Optimization of composition, synthesis, and study of broadband multilayer mirrors for the EUV spectral range
Zhurnal Tekhnicheskoi Fiziki, 89:11 (2019), 1763–1769
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Beryllium as a material for thermally stable X-ray mirrors
Zhurnal Tekhnicheskoi Fiziki, 89:11 (2019), 1686–1691
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Stable multilayer reflective coatings for $\lambda$(HeI) = 58.4 nm for the kortes solar telescope
Pisma v Zhurnal Tekhnicheskoi Fiziki, 45:3 (2019), 26–29
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Comparison of approaches in the manufacture of broadband mirrors for the EUV range: aperiodic and stack structures
Kvantovaya Elektronika, 49:4 (2019), 380–385
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Absolutely calibrated spectrally resolved measurements of Xe laser plasma radiation intensity in the EUV range
Zhurnal Tekhnicheskoi Fiziki, 88:10 (2018), 1554–1558
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Laboratory reflectometer for the investigation of optical elements in a wavelength range of 5 – 50 nm: description and testing results
Kvantovaya Elektronika, 47:4 (2017), 385–392
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Effect of structural defects of aperiodic multilayer mirrors on the properties of reflected (sub)femtosecond pulses
Kvantovaya Elektronika, 47:4 (2017), 378–384
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The diffraction efficiency of echelle gratings increased by ion-beam polishing of groove surfaces
Pisma v Zhurnal Tekhnicheskoi Fiziki, 42:16 (2016), 34–40
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Effect of roughness, deterministic and random errors in film thickness on the reflecting properties of aperiodic mirrors for the EUV range
Kvantovaya Elektronika, 46:5 (2016), 406–413
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X-ray optical system for imaging laser plumes with a spatial resolution of up to 70 nm
Kvantovaya Elektronika, 46:4 (2016), 347–352
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A new alternative to secondary CsM$^+$ ions for depth profiling of multilayer metal structures by secondary ion mass spectrometry
Pisma v Zhurnal Tekhnicheskoi Fiziki, 38:24 (2012), 75–85
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Silicon photodiode with selective Zr/Si coating for extreme ultraviolet spectral range
Kvantovaya Elektronika, 42:10 (2012), 943–948
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Multilayer X-ray mirrors based on La/B$_4$C and La/B$_9$C
Zhurnal Tekhnicheskoi Fiziki, 80:8 (2010), 93–100
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Beryllium-based multilayer X-ray optics
UFN, 190:1 (2020), 92–106
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