Melnikov Sergei Nikolaevich

Publications in Math-Net.Ru

1. Influence of the method of gas supply to the chamber on the processes of reactive magnetron sputtering of Ti–Al composite target
   
   Zhurnal Tekhnicheskoi Fiziki, 93:3 (2023),  409–416
2. Influence of aluminum doping degree on the properties of titanium-aluminum oxide films
   
   PFMT, 2023, no. 2(55),  74–82
3. Peculiarity of reactive magnetron deposition of tantalum oxide films with different methods of gas supply into the chamber
   
   PFMT, 2022, no. 3(52),  97–104
4. Formation of tantalum oxide films on substrates with a diameter of 200 mm
   
   PFMT, 2020, no. 1(42),  12–17
5. Ferroelectric properties of strontium-bismuth tantalate thin film deposited by RF magnetron sputtering method
   
   PFMT, 2018, no. 1(34),  33–37
6. Formation of titanium nitride films by reactive magnetron sputtering under low pressure
   
   PFMT, 2016, no. 2(27),  12–17
7. Prediction of targets erosion in magnetron sputtering systems
   
   PFMT, 2010, no. 2(3),  62–67