Golosov Dmitrii Anatol'evich

Publications in Math-Net.Ru

1. Influence of the method of gas supply to the chamber on the processes of reactive magnetron sputtering of Ti–Al composite target
   
   Zhurnal Tekhnicheskoi Fiziki, 93:3 (2023),  409–416
2. Influence of aluminum doping degree on the properties of titanium-aluminum oxide films
   
   PFMT, 2023, no. 2(55),  74–82
3. Peculiarity of reactive magnetron deposition of tantalum oxide films with different methods of gas supply into the chamber
   
   PFMT, 2022, no. 3(52),  97–104
4. Formation of tantalum oxide films on substrates with a diameter of 200 mm
   
   PFMT, 2020, no. 1(42),  12–17
5. Dielectric properties of tantalum oxide thin films deposited by reactive magnetron sputtering
   
   PFMT, 2019, no. 2(39),  15–20
6. Ferroelectric properties of strontium-bismuth tantalate thin film deposited by RF magnetron sputtering method
   
   PFMT, 2018, no. 1(34),  33–37
7. Ferroelectric properties of niobium-doped strontium bismuth tantalate films
   
   Fizika Tverdogo Tela, 58:1 (2016),  51–55
8. Formation of titanium nitride films by reactive magnetron sputtering under low pressure
   
   PFMT, 2016, no. 2(27),  12–17
9. Joint functioning of a magnetron sputtering system and an end-Hall ion source
   
   Zhurnal Tekhnicheskoi Fiziki, 84:9 (2014),  66–73
10. On the sol–gel synthesis of strontium-titanate thin films and the prospects of their use in electronics
    
    Fizika i Tekhnika Poluprovodnikov, 48:12 (2014),  1724–1726
11. Electrical and optical properties of zinc-oxide films deposited by the ion-beam sputtering of an oxide target
    
    Fizika i Tekhnika Poluprovodnikov, 48:9 (2014),  1274–1279
12. Prediction of targets erosion in magnetron sputtering systems
    
    PFMT, 2010, no. 2(3),  62–67