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Fedina Ludmila Ivanovna

Publications in Math-Net.Ru

  1. Redistribution of erbium and oxygen recoil atoms and the structure of silicon thin surface layers formed by high-dose argon implantation through Er and SiO$_{2}$ surface films

    Fizika i Tekhnika Poluprovodnikov, 52:13 (2018),  1589–1596
  2. Precipitation of boron in silicon on high-dose implantation

    Fizika i Tekhnika Poluprovodnikov, 44:3 (2010),  302–305
  3. Instability of the distribution of atomic steps on Si(111) upon submonolayer gold adsorption at high temperatures

    Pis'ma v Zh. Èksper. Teoret. Fiz., 81:3 (2005),  149–153
  4. Point defect interaction with $\mathrm{B}$ atoms and $\mathrm{P}$ atoms in $\mathrm{Si}$ at a high Frenkel pair creation rate

    Fizika Tverdogo Tela, 32:1 (1990),  60–68


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