Naumov Viktor Vasil'evich

Publications in Math-Net.Ru

1. Оптическая ширина запрещенной зоны литированного композита Si@O@Al
   
   Pisma v Zhurnal Tekhnicheskoi Fiziki, 52:4 (2026),  33–36
2. Nanostructuring of the surface of Bi$_2$Te$_3$ epitaxial films during ion-plasma treatment
   
   Fizika Tverdogo Tela, 66:8 (2024),  1408–1416
3. Changes of the crystalline texture and resistivity of Ti films under ion bombardment
   
   Zhurnal Tekhnicheskoi Fiziki, 93:10 (2023),  1509–1519
4. Determination of the Band Structure and Conductivity of the Si@O@Al Nanocomposite
   
   Zhurnal Tekhnicheskoi Fiziki, 93:10 (2023),  1447–1458
5. Influence of varistor effect and contact phenomena on the characteristics of solid-state lithium-ion batteries with semiconductor electrodes
   
   Zhurnal Tekhnicheskoi Fiziki, 93:9 (2023),  1329–1339
6. Resistivity of thin-film electrodes Si@O@Al and LiCoO$_2$
   
   Pisma v Zhurnal Tekhnicheskoi Fiziki, 49:14 (2023),  8–12
7. Impedance of a thin-film lithium-ion battery Si@O@Al|LiPON|LiCoO$_2$ at temperatures from -20$^\circ$C to +50$^\circ$C
   
   Pisma v Zhurnal Tekhnicheskoi Fiziki, 49:7 (2023),  20–23
8. Features of the current-voltage characteristic of the Ti–Si@O@Al junction Ti–Si@O@Al
   
   Pisma v Zhurnal Tekhnicheskoi Fiziki, 48:17 (2022),  9–12
9. Schottky barrier in Si–M structures of solid-state lithium-ion batteries
   
   Pisma v Zhurnal Tekhnicheskoi Fiziki, 48:12 (2022),  32–35
10. Formation of (100) texture in thin ti films under low-energy ion bombardment
    
    Pisma v Zhurnal Tekhnicheskoi Fiziki, 47:23 (2021),  35–39
11. The influence of film thickness on the annealing-induced changes of texture and of the fraction of crystalline phase in Pt films
    
    Zhurnal Tekhnicheskoi Fiziki, 90:5 (2020),  795–804
12. The influence of diffusion barriers on the capacitance properties of composite anodes with Si–CuSi–Cu composition
    
    Pisma v Zhurnal Tekhnicheskoi Fiziki, 46:19 (2020),  3–6
13. A solid-state lithium-ion battery: structure, technology, and characteristics
    
    Pisma v Zhurnal Tekhnicheskoi Fiziki, 46:5 (2020),  15–18
14. Formation of nanoporous copper-silicide films
    
    Fizika i Tekhnika Poluprovodnikov, 53:3 (2019),  418–422
15. Structural changes in Si–CuSi films upon intercalation of lithium ions
    
    Pisma v Zhurnal Tekhnicheskoi Fiziki, 45:19 (2019),  17–20
16. The influence of film thickness on annealing-induced grain growth in Pt films
    
    Zhurnal Tekhnicheskoi Fiziki, 88:6 (2018),  926–933
17. The formation of hollow lead structures on the surface of PbSe films treated in argon plasma
    
    Pisma v Zhurnal Tekhnicheskoi Fiziki, 44:12 (2018),  32–38
18. Influence of a static magnetic field on the formation of silicide phases in a Cu/Si(100) structure upon isothermal annealing
    
    Fizika i Tekhnika Poluprovodnikov, 51:6 (2017),  844–849
19. An experimental examination of thin films of lithium phosphorus oxynitride (a solid electrolyte)
    
    Pisma v Zhurnal Tekhnicheskoi Fiziki, 43:11 (2017),  3–11
20. Changes in the conductivity of lead-selenide thin films after plasma etching
    
    Fizika i Tekhnika Poluprovodnikov, 50:8 (2016),  1146–1150
21. Formation of W/HfO$_2$/Si gate structures using in situ magnetron sputtering and rapid thermal annealing
    
    Zhurnal Tekhnicheskoi Fiziki, 84:5 (2014),  82–87
22. Magnetomigration effect during the annealing of granular cobalt-copper films
    
    Pisma v Zhurnal Tekhnicheskoi Fiziki, 40:4 (2014),  9–15
23. Magnetomigration in granular cobalt-copper films deposited by the ion-plasma method
    
    Pisma v Zhurnal Tekhnicheskoi Fiziki, 39:12 (2013),  35–43
24. The effect of ion energy on the surface morphology of platinum film under high-frequency ion plasma sputtering
    
    Pisma v Zhurnal Tekhnicheskoi Fiziki, 39:2 (2013),  68–75
25. Formation and investigation of cobalt silicide ultrathin layers in Ti/Co/Ti-, TiN/Ti/Co-, and TiN/Co-on-silicon structures
    
    Zhurnal Tekhnicheskoi Fiziki, 82:2 (2012),  122–128
26. Lead selenide nanowire growth by vapor-liquid-solid mechanism under mask during plasma processing
    
    Pisma v Zhurnal Tekhnicheskoi Fiziki, 37:19 (2011),  80–87
27. Features of CoSi$_2$ phase formation by two-stage rapid thermal annealing of Ti/Co/Ti/Si(100) structures
    
    Pisma v Zhurnal Tekhnicheskoi Fiziki, 37:3 (2011),  36–44