Pestov Alexey Evgen'evich

Publications in Math-Net.Ru

1. Формирование перспективных для электронно-лучевой и экстремально-ультрафиолетовой нанолитографии тонкопленочных резистивных материалов на основе оловоорганических оксокластеров
   
   Zhurnal Tekhnicheskoi Fiziki, 96:2 (2026),  383–394
2. Double-mirror monochromator for the 4+ generation “SKIF” synchrotron light source
   
   Zhurnal Tekhnicheskoi Fiziki, 95:10 (2025),  1963–1972
3. Kirkpatrick–Baez focusing system for synchrotron applications
   
   Zhurnal Tekhnicheskoi Fiziki, 95:10 (2025),  1954–1962
4. Ion beam machine for correction and aspherization of the surface shape of optical elements UIP-300
   
   Zhurnal Tekhnicheskoi Fiziki, 95:9 (2025),  1825–1835
5. Stand for testing extreme ultraviolet sensitive photoresists
   
   Zhurnal Tekhnicheskoi Fiziki, 94:8 (2024),  1323–1330
6. Correlative extreme ultraviolet, ultraviolet and optical microscopy based on a specular microscope with axial tomography
   
   Zhurnal Tekhnicheskoi Fiziki, 94:8 (2024),  1302–1313
7. Multilayer mirrors based on Cr/Ti for X-Ray microscopy in the “water window”
   
   Zhurnal Tekhnicheskoi Fiziki, 94:8 (2024),  1250–1259
8. Capsule gas-filled target for a laser-plasma EUV source
   
   Zhurnal Tekhnicheskoi Fiziki, 94:7 (2024),  1174–1181
9. Using of ion-beam etching of free-standing films for the development of wavefront correctors in the EUV wavelength range
   
   Zhurnal Tekhnicheskoi Fiziki, 94:7 (2024),  1029–1035
10. Acceleration of electrons upon interaction of laser pulses with solid targets in the laser peeler regime
    
    Kvantovaya Elektronika, 54:1 (2024),  35–42
11. Investigation of the angular dependences of the velocities of ion-beam sputtering of metals for the synthesis of mask blanks
    
    Zhurnal Tekhnicheskoi Fiziki, 93:7 (2023),  1051–1053
12. Study of the effect of neon ion energy on the surface roughness of the main cuts of monocrystalline silicon during ion etching
    
    Zhurnal Tekhnicheskoi Fiziki, 93:7 (2023),  1046–1050
13. The coating a liquid glass of the optical element substrates and its molecular composition
    
    Zhurnal Tekhnicheskoi Fiziki, 93:7 (2023),  1037–1045
14. Off-axis aspherical collector for EUV-lithography and SXR microscopy
    
    Zhurnal Tekhnicheskoi Fiziki, 93:7 (2023),  963–967
15. Emission characteristics of a laser-plasma source of extreme ultraviolet radiation with thin-film targets
    
    Zhurnal Tekhnicheskoi Fiziki, 93:7 (2023),  892–896
16. Prospects for the use of reactive ion-beam etching of fused quartz with a mixture of tetrafluoromethane and argon for aspherizing the surface of optical elements
    
    Zhurnal Tekhnicheskoi Fiziki, 92:8 (2022),  1248–1252
17. Diamond-carbide-silicon composite “skeleton” as a promising material for X-ray optical substrates
    
    Zhurnal Tekhnicheskoi Fiziki, 92:8 (2022),  1238–1242
18. Model of physical sputtering of amorphous materials
    
    Zhurnal Tekhnicheskoi Fiziki, 92:8 (2022),  1230–1237
19. Study of the influence of the energy of argon ions on the surface roughness of the main sections of single-crystal silicon
    
    Zhurnal Tekhnicheskoi Fiziki, 92:8 (2022),  1219–1223
20. Imaging system of a plasma torch of a Betatron X-ray source
    
    Zhurnal Tekhnicheskoi Fiziki, 92:8 (2022),  1202–1206
21. Thin film Al targets for a laser-plasma source of extreme ultraviolet radiation
    
    Zhurnal Tekhnicheskoi Fiziki, 92:8 (2022),  1199–1201
22. Application of cerium oxide nanopowders for silicon polishing
    
    Zhurnal Tekhnicheskoi Fiziki, 91:10 (2021),  1588–1596
23. Wavefront lens corrector for studying flat surfaces
    
    Zhurnal Tekhnicheskoi Fiziki, 91:10 (2021),  1583–1587
24. Manufacturing and research of mirrors with a wide bandwidth for synchrotron applications
    
    Zhurnal Tekhnicheskoi Fiziki, 91:10 (2021),  1524–1531
25. Measurements of the absolute values of the radiation intensity in the wavelength range of 6.6–32 nm of stainless steel targets with pulsed laser excitation
    
    Zhurnal Tekhnicheskoi Fiziki, 91:10 (2021),  1448–1453
26. Solar VUV telescope for nanosatellites
    
    Zhurnal Tekhnicheskoi Fiziki, 91:10 (2021),  1441–1447
27. Measurements of the absolute intensities of spectral lines of Kr, Ar, and O ions in the wavelength range of 10--18 nm under pulsed laser excitation
    
    Kvantovaya Elektronika, 51:8 (2021),  700–707
28. Ion-beam methods for high-precision processing of optical surfaces
    
    Zhurnal Tekhnicheskoi Fiziki, 90:11 (2020),  1922–1930
29. Material surface treatment for design of composite optical elements
    
    Zhurnal Tekhnicheskoi Fiziki, 90:11 (2020),  1913–1916
30. Modification and polishing of the holographic diffraction grating grooves by a neutralized Ar ion beam
    
    Zhurnal Tekhnicheskoi Fiziki, 90:11 (2020),  1864–1869
31. Prospects for the use of X-ray tubes with a field-emission cathode and a through-type anode in the range of soft X-ray radiation
    
    Zhurnal Tekhnicheskoi Fiziki, 90:11 (2020),  1806–1816
32. Diffraction limited X-ray optics: technology, metrology, applications
    
    UFN, 190:1 (2020),  74–91
33. Beryllium as a material for thermally stable X-ray mirrors
    
    Zhurnal Tekhnicheskoi Fiziki, 89:11 (2019),  1686–1691
34. Simulation of local error correction of the surface shape by a low-dimensional ion beam
    
    Zhurnal Tekhnicheskoi Fiziki, 89:11 (2019),  1650–1655
35. The diffraction efficiency of echelle gratings increased by ion-beam polishing of groove surfaces
    
    Pisma v Zhurnal Tekhnicheskoi Fiziki, 42:16 (2016),  34–40
36. X-ray optical system for imaging laser plumes with a spatial resolution of up to 70 nm
    
    Kvantovaya Elektronika, 46:4 (2016),  347–352
37. Investigation of supersmooth optical surfaces and multilayer elements using soft X-ray radiation
    
    Zhurnal Tekhnicheskoi Fiziki, 83:9 (2013),  134–142
38. Silicon photodiode with selective Zr/Si coating for extreme ultraviolet spectral range
    
    Kvantovaya Elektronika, 42:10 (2012),  943–948
39. Precision imaging multilayer optics for soft X-rays and extreme ultraviolet bands
    
    UFN, 182:7 (2012),  727–747
40. Multilayer X-ray mirrors based on La/B$_4$C and La/B$_9$C
    
    Zhurnal Tekhnicheskoi Fiziki, 80:8 (2010),  93–100


41. Dispersion elements for X-ray mirror spectrometer on a range of 7–30 nm
    
    Zhurnal Tekhnicheskoi Fiziki, 93:7 (2023),  1002–1008