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Publications in Math-Net.Ru
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Ultrafast luminescence kinetics and localization effects of nonequilibrium carriers in degenerate $n$-InGaN layers
Pis'ma v Zh. Èksper. Teoret. Fiz., 121:8 (2025), 688–695
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Photoinduced band-gap renormalization in degenerate narrow-gap $n$-InGaN epitaxial films
Fizika i Tekhnika Poluprovodnikov, 59:9 (2025), 563–570
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Formation of planar structures with InGaN layers for red wavelength light sources
Fizika i Tekhnika Poluprovodnikov, 59:7 (2025), 406–413
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Influence of the ratio of group III and V fluxes on the structural, emissive properties properties and stimulated emission of planar structures with InGaN layers in the IR range
Fizika i Tekhnika Poluprovodnikov, 58:4 (2024), 220–225
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Features of formation of In$_x$Ga$_{1-x}$N bulk layers in the immiscibility gap of solid solutions ($x$ $\sim$ 0.6) by molecular beam epitaxy with plasma nitrogen activation
Fizika i Tekhnika Poluprovodnikov, 57:6 (2023), 444–450
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Formation of heterostructures with multiple quantum wells InN/InGaN by the PA-MBE method on sapphire
Fizika i Tekhnika Poluprovodnikov, 56:9 (2022), 848–854
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PA MBE growth of intermediate-composition InGaN layers for red and near-IR laser sources
Fizika i Tekhnika Poluprovodnikov, 56:7 (2022), 700–704
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Features of the structural and optical properties of InGaN layers obtained by the MBE PA method with a pulsed supply of metal flows
Fizika i Tekhnika Poluprovodnikov, 55:9 (2021), 766–772
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Radiative properties of up-conversion coatings formed on the basis of erbium-doped barium titanate xerogels
Fizika i Tekhnika Poluprovodnikov, 55:9 (2021), 713–718
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Ge/Si core/shell quantum dots in an alumina matrix: influence of the annealing temperature on the optical properties
Fizika i Tekhnika Poluprovodnikov, 54:2 (2020), 129–137
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Emission properties of heavily doped epitaxial indium-nitride layers
Fizika i Tekhnika Poluprovodnikov, 53:10 (2019), 1395–1400
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Comparative analysis of luminescence properties of Ge : Sb layers grown on Ge(001) and Si(001) substrates
Fizika i Tekhnika Poluprovodnikov, 53:10 (2019), 1354–1359
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Specific features of the photoexcitation spectra of epitaxial InN layers grown by molecular-beam epitaxy with the plasma activation of nitrogen
Fizika i Tekhnika Poluprovodnikov, 51:12 (2017), 1594–1598
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Features of InN growth by nitrogen-plasma-assisted MBE at different ratios of fluxes of group-III and -V elements
Fizika i Tekhnika Poluprovodnikov, 50:2 (2016), 264–268
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Absorption cross section for the $^4I_{15/2}\to^4I_{13/2}$ transition of Er$^{3+}$ in Si:Er:O/SOI epitaxial layers
Pis'ma v Zh. Èksper. Teoret. Fiz., 100:12 (2014), 913–918
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Effect of the annealing temperature on the low-temperature photoluminescence in Si:Er light-emitting structures grown by molecular-beam epitaxy
Fizika i Tekhnika Poluprovodnikov, 47:10 (2013), 1344–1346
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Mechanism of the subband excitation of photoluminescence from erbium ions in silicon under high-intensity optical pumping
Fizika i Tekhnika Poluprovodnikov, 46:11 (2012), 1435–1439
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Determination of the excitation cross section of photoluminescence from an Er ion in the case of homogeneous and inhomogeneous optical excitation
Fizika i Tekhnika Poluprovodnikov, 46:11 (2012), 1398–1401
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Electroluminescence at a wavelength of 1.54 $\mu$m in Si:Er/Si structures consisting of a number of $p$–$n$ junctions
Fizika i Tekhnika Poluprovodnikov, 45:11 (2011), 1486–1488
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Dependence of the concentration of ionized donors on epitaxy temperature for Si:Er/Si layers grown by sublimation molecular-beam epitaxy
Fizika i Tekhnika Poluprovodnikov, 45:1 (2011), 132–135
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Electroluminescence at a wavelength of 1.5 $\mu$m in Si:Er/Si diode structures doped with Al, Ga, and B acceptors
Fizika i Tekhnika Poluprovodnikov, 44:12 (2010), 1645–1648
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Specific features of the mechanisms of excitation of erbium photoluminescence in epitaxial Si:Er/Si structures
Fizika i Tekhnika Poluprovodnikov, 44:11 (2010), 1519–1522
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GaAsSb/GaAs strained structures with quantum wells for lasers with emission wavelength near 1.3 $\mu$m
Fizika i Tekhnika Poluprovodnikov, 44:3 (2010), 422–429
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Dependence of the energy of the resonance states of an acceptor in silicon on the host isotopic mass
Pis'ma v Zh. Èksper. Teoret. Fiz., 90:6 (2009), 501–504
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Production of nanocrystalline silicon layers using the plasma enhanced chemical vapor deposition from the gas phase of silicon tetrafluoride
Pis'ma v Zh. Èksper. Teoret. Fiz., 89:2 (2009), 80–83
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Oscillator strengths of optical transitions in shallow impurities and impurity complexes in silicon and germanium
Fizika i Tekhnika Poluprovodnikov, 26:5 (1992), 927–934
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