Razhev Aleksandr Mikhailovich

Publications in Math-Net.Ru

1. Neon laser with wavelength $\lambda$ = 585.3 nm pumped by pulsed inductive longitudinal discharge
   
   Zhurnal Tekhnicheskoi Fiziki, 95:6 (2025),  1118–1125
2. Generation mechanism of the UV nitrogen laser pumped by a pulsed longitudinal inductive discharge
   
   Kvantovaya Elektronika, 54:8 (2024),  467–471
3. Nitrogen laser pumped by a pulsed longitudinal electric and inductive discharges
   
   Pisma v Zhurnal Tekhnicheskoi Fiziki, 49:20 (2023),  8–10
4. Pulsed RF excitation inductive discharge CO$_2$ laser with the radiation energy of 1J and high efficiency
   
   Optics and Spectroscopy, 130:3 (2022),  400–406
5. Effect of laser UV radiation on the eye scleral tissue in patients with open-angle glaucoma
   
   Kvantovaya Elektronika, 48:5 (2018),  481–486
6. Pulsed inductive HF laser
   
   Kvantovaya Elektronika, 46:3 (2016),  210–212
7. High-power gas-discharge excimer ArF, KrCl, KrF and XeCl lasers utilising two-component gas mixtures without a buffer gas
   
   Kvantovaya Elektronika, 46:3 (2016),  205–209
8. Study of the UV emission of an inductive nitrogen laser
   
   Kvantovaya Elektronika, 39:10 (2009),  901–905
9. Influence of the specific pump power on the output energy and efficiency of a 223-nm gas-discharge-pumped excimer KrCl laser
   
   Kvantovaya Elektronika, 38:11 (2008),  1005–1008
10. Inductive ultraviolet nitrogen laser
    
    Pis'ma v Zh. Èksper. Teoret. Fiz., 86:6 (2007),  479–483
11. 703-to 731-nm FI laser excited by a transverse inductive discharge
    
    Pis'ma v Zh. Èksper. Teoret. Fiz., 82:5 (2005),  290–294
12. Influence of excitation parameters and active medium on the efficiency of an electric-discharge excimer ArF laser
    
    Kvantovaya Elektronika, 35:9 (2005),  799–804
13. Effect of the pump intensity on the efficiency of a KrF excimer electric-discharge laser on a He–Kr–F₂ mixture
    
    Kvantovaya Elektronika, 34:10 (2004),  901–906
14. A 223-nm KrCl excimer laser on a He–Kr–HCl mixture
    
    Kvantovaya Elektronika, 34:2 (2004),  95–98
15. Excimer KrF laser with He buffer gas, 0.8 J energy, and 2% efficiency
    
    Kvantovaya Elektronika, 25:8 (1998),  687–689
16. Emission spectrum of an electric-discharge ClF laser
    
    Kvantovaya Elektronika, 25:6 (1998),  501–504
17. Excimer ArF laser with an output energy of 0.5 J and He buffer gas
    
    Kvantovaya Elektronika, 24:8 (1997),  683–687
18. Dependences of the plasma parameters and output energy of excimer lasers on the Xe content in an He–Xe–HCl mixture
    
    Kvantovaya Elektronika, 15:11 (1988),  2309–2317
19. Efficient electrodischarge $F_{2}$-laser on 157.6 nm
    
    Pisma v Zhurnal Tekhnicheskoi Fiziki, 12:3 (1986),  157–160
20. High-power efficient vacuum ultraviolet F₂ laser excited by an electric discharge
    
    Kvantovaya Elektronika, 13:5 (1986),  1072–1075
21. Surface photorefractive effect in a lithium niobate crystal
    
    Kvantovaya Elektronika, 13:4 (1986),  849–851
22. EXCIMERIC LASER WITH 2 SYNCHRONOUSLY EXCITED ACTIVE MEDIA
    
    Zhurnal Tekhnicheskoi Fiziki, 55:4 (1985),  664–668
23. Excimer laser with two simultaneously excited active zones
    
    Kvantovaya Elektronika, 12:11 (1985),  2269–2274
24. Electric-discharge XeCl laser with high spatial homogeneity and energy density of output radiation
    
    Kvantovaya Elektronika, 11:2 (1984),  287–291
25. Active mode locking in an XeCl laser
    
    Kvantovaya Elektronika, 9:1 (1982),  150–152
26. Ultraviolet dye lasers pumped by excimer lasers
    
    Kvantovaya Elektronika, 5:2 (1978),  424–425
27. Single-frequency emission from a nitrogen laser
    
    Kvantovaya Elektronika, 4:2 (1977),  448–451
28. Ultraviolet nitrogen laser with an output power of 0.5 W
    
    Kvantovaya Elektronika, 2:8 (1975),  1777–1780


29. Эксимерный ArF-лазер с энергией 0.5 Дж на основе буферного газа Не («Квантовая электроника», 1997, т.24, №8, с.683–687)
    
    Kvantovaya Elektronika, 24:9 (1997),  864