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Publications in Math-Net.Ru
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Automated system for measuring the surface shape of large-size flat and cylindrical mirrors on a Fizeau interferometer
Zhurnal Tekhnicheskoi Fiziki, 95:10 (2025), 1984–1994
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Electron beam diagnostics using hard X-rays at the SRF SKIF
Zhurnal Tekhnicheskoi Fiziki, 95:10 (2025), 1973–1983
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Double-mirror monochromator for the 4+ generation “SKIF” synchrotron light source
Zhurnal Tekhnicheskoi Fiziki, 95:10 (2025), 1963–1972
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Kirkpatrick–Baez focusing system for synchrotron applications
Zhurnal Tekhnicheskoi Fiziki, 95:10 (2025), 1954–1962
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Reconstruction of optical constants of thin films from laboratory reflectometers
Zhurnal Tekhnicheskoi Fiziki, 95:10 (2025), 1946–1953
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Applicability of white light interferometers for measuring the roughness of X-ray optical elements
Zhurnal Tekhnicheskoi Fiziki, 95:10 (2025), 1887–1897
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A compact spectrograph based on a VLS grating for the range of 3–20 nm
Zhurnal Tekhnicheskoi Fiziki, 95:10 (2025), 1879–1886
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Ion beam machine for correction and aspherization of the surface shape of optical elements UIP-300
Zhurnal Tekhnicheskoi Fiziki, 95:9 (2025), 1825–1835
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Structural and reflective characteristics of Cr/C multilayer mirrors synthesized by reactive sputtering method
Zhurnal Tekhnicheskoi Fiziki, 95:9 (2025), 1817–1824
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Multilayer NiMo/C structures fabricated by reactive magnetron sputtering
Zhurnal Tekhnicheskoi Fiziki, 95:9 (2025), 1808–1816
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Radial distribution of emitting centers in Ar laser plasma
Zhurnal Tekhnicheskoi Fiziki, 95:9 (2025), 1647–1655
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Experimental stand for studying the characteristics of powerful laser-plasma sources of EUV radiation
Zhurnal Tekhnicheskoi Fiziki, 95:9 (2025), 1639–1646
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Calculation and experimental determination of the length of a laser spark in gas-jet targets
Zhurnal Tekhnicheskoi Fiziki, 95:7 (2025), 1289–1296
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Absorption of laser radiation in lps with gas-jet targets
Zhurnal Tekhnicheskoi Fiziki, 95:7 (2025), 1283–1288
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Study of structural and reflective characteristics of multilayer X-ray mirrors based on a pair of Ru/B materials
Pisma v Zhurnal Tekhnicheskoi Fiziki, 51:1 (2025), 57–60
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Stand for testing extreme ultraviolet sensitive photoresists
Zhurnal Tekhnicheskoi Fiziki, 94:8 (2024), 1323–1330
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Correlative extreme ultraviolet, ultraviolet and optical microscopy based on a specular microscope with axial tomography
Zhurnal Tekhnicheskoi Fiziki, 94:8 (2024), 1302–1313
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The Maskless litographer of direct drawing. Design, structure and application
Zhurnal Tekhnicheskoi Fiziki, 94:8 (2024), 1295–1301
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High-gradient aspherization of substrates with thin-film Al/Si coatings
Zhurnal Tekhnicheskoi Fiziki, 94:8 (2024), 1288–1294
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Ni-based multilayer structures for Goebel-type mirrors
Zhurnal Tekhnicheskoi Fiziki, 94:8 (2024), 1280–1287
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Study of the structural and reflective characteristics of short-period Mo/Be multilayer X-ray mirrors
Zhurnal Tekhnicheskoi Fiziki, 94:8 (2024), 1269–1279
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Boron based X-ray multilayer mirrors for the spectral range 6.7–9 nm
Zhurnal Tekhnicheskoi Fiziki, 94:8 (2024), 1260–1268
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Multilayer mirrors based on Cr/Ti for X-Ray microscopy in the “water window”
Zhurnal Tekhnicheskoi Fiziki, 94:8 (2024), 1250–1259
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Capsule gas-filled target for a laser-plasma EUV source
Zhurnal Tekhnicheskoi Fiziki, 94:7 (2024), 1174–1181
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High-frequency low-blaze-angle Mo/Be diffraction gratings – efficiency study
Zhurnal Tekhnicheskoi Fiziki, 94:7 (2024), 1128–1135
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High-frequency multilayer diffraction Si-gratings with a low blaze angle – fabrication
Zhurnal Tekhnicheskoi Fiziki, 94:7 (2024), 1119–1127
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Using of ion-beam etching of free-standing films for the development of wavefront correctors in the EUV wavelength range
Zhurnal Tekhnicheskoi Fiziki, 94:7 (2024), 1029–1035
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Investigations of Microscopic X-ray tomography
Zhurnal Tekhnicheskoi Fiziki, 94:7 (2024), 992–1001
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Investigation of the angular dependences of the velocities of ion-beam sputtering of metals for the synthesis of mask blanks
Zhurnal Tekhnicheskoi Fiziki, 93:7 (2023), 1051–1053
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Study of the effect of neon ion energy on the surface roughness of the main cuts of monocrystalline silicon during ion etching
Zhurnal Tekhnicheskoi Fiziki, 93:7 (2023), 1046–1050
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The coating a liquid glass of the optical element substrates and its molecular composition
Zhurnal Tekhnicheskoi Fiziki, 93:7 (2023), 1037–1045
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Substrates for soft X-ray microscopy based on Si$_3$N$_4$ membranes
Zhurnal Tekhnicheskoi Fiziki, 93:7 (2023), 1032–1036
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Project of X-ray optical scheme of a lithograph with a transmissive dynamic mask and a synchrotron radiation source
Zhurnal Tekhnicheskoi Fiziki, 93:7 (2023), 980–987
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Off-axis aspherical collector for EUV-lithography and SXR microscopy
Zhurnal Tekhnicheskoi Fiziki, 93:7 (2023), 963–967
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Short-period multilayer mirrors for high-resolution multilayer mirror/crystal monochromator
Zhurnal Tekhnicheskoi Fiziki, 93:7 (2023), 943–947
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Investigation of the properties of multilayer mirrors based on a pair of materials Mo/B$_4$C
Zhurnal Tekhnicheskoi Fiziki, 93:7 (2023), 931–935
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Emission characteristics of a laser-plasma source of extreme ultraviolet radiation with thin-film targets
Zhurnal Tekhnicheskoi Fiziki, 93:7 (2023), 892–896
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The theory of axial tomography based on the inverse Radon transform for high-aperture soft X-ray microscopy
Zhurnal Tekhnicheskoi Fiziki, 93:7 (2023), 867–879
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Study of the emission spectra of Cl-, Br-, I-containing targets in the spectral range of 3–6.5 nm when excited by pulsed laser radiation
Kvantovaya Elektronika, 53:5 (2023), 425–429
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Method for obtaining atomically smooth substrates from single-crystal silicon by mechanical lapping
Zhurnal Tekhnicheskoi Fiziki, 92:8 (2022), 1267–1272
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Project of a two-mirror monochromator for the photon energy range 8–36 keV for the “SKIF” synchrotron
Zhurnal Tekhnicheskoi Fiziki, 92:8 (2022), 1261–1266
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Prospects for the use of reactive ion-beam etching of fused quartz with a mixture of tetrafluoromethane and argon for aspherizing the surface of optical elements
Zhurnal Tekhnicheskoi Fiziki, 92:8 (2022), 1248–1252
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Diamond-carbide-silicon composite “skeleton” as a promising material for X-ray optical substrates
Zhurnal Tekhnicheskoi Fiziki, 92:8 (2022), 1238–1242
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Model of physical sputtering of amorphous materials
Zhurnal Tekhnicheskoi Fiziki, 92:8 (2022), 1230–1237
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Study of the influence of the energy of argon ions on the surface roughness of the main sections of single-crystal silicon
Zhurnal Tekhnicheskoi Fiziki, 92:8 (2022), 1219–1223
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Prospective wavelengths for projection lithography uing synchrotron radiation
Zhurnal Tekhnicheskoi Fiziki, 92:8 (2022), 1207–1212
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Imaging system of a plasma torch of a Betatron X-ray source
Zhurnal Tekhnicheskoi Fiziki, 92:8 (2022), 1202–1206
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Thin film Al targets for a laser-plasma source of extreme ultraviolet radiation
Zhurnal Tekhnicheskoi Fiziki, 92:8 (2022), 1199–1201
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Investigation of the emission properties of gas-jet targets in the “water transparency window” of 2.3–4.4 nm under pulsed laser excitation
Zhurnal Tekhnicheskoi Fiziki, 92:8 (2022), 1185–1191
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Ru/Sr multilayer mirrors for the spectral range 9–12 nm
Zhurnal Tekhnicheskoi Fiziki, 92:8 (2022), 1179–1184
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Search for high-strength multilayer free-standing film filters with high transmittance in the wavelength range of the “water window” (2.3–4.4 nm)
Zhurnal Tekhnicheskoi Fiziki, 92:8 (2022), 1130–1136
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Research and creation of broadband X-ray mirrors with a spectral transmission band coinciding with emission lines and the possibility of filtering
Zhurnal Tekhnicheskoi Fiziki, 92:8 (2022), 1107–1112
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Comparative study of the thermal stability of Be-based extreme ultraviolet pellicles
Zhurnal Tekhnicheskoi Fiziki, 92:1 (2022), 92–99
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Emission spectra of liquid-jet targets of hexane C$_6$Н$_{14}$, dichloromethane CH$_2$Cl$_2$, methylene bromide CH$_3$Br in the range 4–20 nm under pulsed laser excitation
Optics and Spectroscopy, 130:7 (2022), 991–995
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Emission spectra of molecular gases CHF$_3$, CCl$_2$F$_2$, SF$_6$ in the range 3–20 nm under pulsed laser excitation using various gas jets as targets
Optics and Spectroscopy, 130:2 (2022), 217–223
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Fabrication and testing of Au- and multilayer Mo/Si-coated diffraction gratings with high-order brilliance in high orders in the soft X-ray and EUV ranges
Kvantovaya Elektronika, 52:10 (2022), 955–962
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Application of cerium oxide nanopowders for silicon polishing
Zhurnal Tekhnicheskoi Fiziki, 91:10 (2021), 1588–1596
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Wavefront lens corrector for studying flat surfaces
Zhurnal Tekhnicheskoi Fiziki, 91:10 (2021), 1583–1587
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Manufacturing and research of mirrors with a wide bandwidth for synchrotron applications
Zhurnal Tekhnicheskoi Fiziki, 91:10 (2021), 1524–1531
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Measurements of the absolute values of the radiation intensity in the wavelength range of 6.6–32 nm of stainless steel targets with pulsed laser excitation
Zhurnal Tekhnicheskoi Fiziki, 91:10 (2021), 1448–1453
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Solar VUV telescope for nanosatellites
Zhurnal Tekhnicheskoi Fiziki, 91:10 (2021), 1441–1447
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Emission spectra of molecular gases N$_2$ and CO$_2$ in the range 3–20 nm under pulsed laser excitation using various gas jets as targets
Optics and Spectroscopy, 129:6 (2021), 755–759
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Emission spectra of heavy inert gases Kr, Xe in the range 3–20 nm under pulsed laser excitation using various gas jets as targets
Optics and Spectroscopy, 129:3 (2021), 266–271
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Emission spectra of light inert gases Ne and Ar in the range 3–20 nm under pulsed laser excitation using various gas jet-targets
Optics and Spectroscopy, 129:2 (2021), 146–152
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Measurements of the absolute intensities of spectral lines of Kr, Ar, and O ions in the wavelength range of 10--18 nm under pulsed laser excitation
Kvantovaya Elektronika, 51:8 (2021), 700–707
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Obtaining of smooth high-precision surfaces by the mechanical lapping method
Zhurnal Tekhnicheskoi Fiziki, 90:11 (2020), 1958–1964
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Ion-beam methods for high-precision processing of optical surfaces
Zhurnal Tekhnicheskoi Fiziki, 90:11 (2020), 1922–1930
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Material surface treatment for design of composite optical elements
Zhurnal Tekhnicheskoi Fiziki, 90:11 (2020), 1913–1916
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Multilayer Cr/Sc mirrors with improved reflection for the “water transparency window” range
Zhurnal Tekhnicheskoi Fiziki, 90:11 (2020), 1893–1897
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The microstructure of transition boundaries in multilayer Mo/Be systems
Zhurnal Tekhnicheskoi Fiziki, 90:11 (2020), 1884–1892
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Broadband mirrors for spectroheliographs at the KORTES sun study facility
Zhurnal Tekhnicheskoi Fiziki, 90:11 (2020), 1876–1883
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The smoothing effect of si layers in multilayer Be/Al mirrors for the 17- to 31-nm range
Zhurnal Tekhnicheskoi Fiziki, 90:11 (2020), 1870–1875
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Modification and polishing of the holographic diffraction grating grooves by a neutralized Ar ion beam
Zhurnal Tekhnicheskoi Fiziki, 90:11 (2020), 1864–1869
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Application of novel multilayer normal-incidence mirrors for euv solar spectroscopy
Zhurnal Tekhnicheskoi Fiziki, 90:11 (2020), 1817–1820
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Prospects for the use of X-ray tubes with a field-emission cathode and a through-type anode in the range of soft X-ray radiation
Zhurnal Tekhnicheskoi Fiziki, 90:11 (2020), 1806–1816
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Optimization of an anode membrane with a transmission-type target in a system of soft X-ray sources for X-ray nanolithography
Zhurnal Tekhnicheskoi Fiziki, 90:11 (2020), 1789–1796
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Lasing efficiency of krypton ions in the (8–14)-nm band upon pulsed laser excitation
Kvantovaya Elektronika, 50:4 (2020), 408–413
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Features of multilayer mirror application for focusing and collimating X-rays from inverse Compton scattering sources
Kvantovaya Elektronika, 50:4 (2020), 401–407
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Diffraction limited X-ray optics: technology, metrology, applications
UFN, 190:1 (2020), 74–91
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Development of technological principles for creating a system of microfocus X-ray tubes based on silicon field emission nanocathodes
Zhurnal Tekhnicheskoi Fiziki, 89:12 (2019), 1836–1842
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Measurement error of interferometers with diffraction reference wave
Zhurnal Tekhnicheskoi Fiziki, 89:11 (2019), 1789–1794
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Influence of thermal annealing on the properties of multilayer Mo/Be mirrors
Zhurnal Tekhnicheskoi Fiziki, 89:11 (2019), 1783–1788
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Influence of beryllium barrier layers on the properties of Mo/Si multilayer mirrors
Zhurnal Tekhnicheskoi Fiziki, 89:11 (2019), 1779–1782
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Multilayer Ag/Y mirrors for the spectral range of 9–11 nm
Zhurnal Tekhnicheskoi Fiziki, 89:11 (2019), 1774–1778
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Fabrication and study of a concave crystal mirror for the KORTES project
Zhurnal Tekhnicheskoi Fiziki, 89:11 (2019), 1770–1773
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Optimization of composition, synthesis, and study of broadband multilayer mirrors for the EUV spectral range
Zhurnal Tekhnicheskoi Fiziki, 89:11 (2019), 1763–1769
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Beryllium as a material for thermally stable X-ray mirrors
Zhurnal Tekhnicheskoi Fiziki, 89:11 (2019), 1686–1691
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Optical, mechanical, and thermal properties of free-standing MoSi$_{2}$N$_{x}$ и ZrSi$_{2}$N$_{y}$ nanocomposite films
Zhurnal Tekhnicheskoi Fiziki, 89:11 (2019), 1680–1685
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Emission properties of laser plasma excited on molecular-cluster carbon dioxide jets
Zhurnal Tekhnicheskoi Fiziki, 89:11 (2019), 1656–1662
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Simulation of local error correction of the surface shape by a low-dimensional ion beam
Zhurnal Tekhnicheskoi Fiziki, 89:11 (2019), 1650–1655
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Observation of laser-induced spark in the density jump in a gas-jet target
Pisma v Zhurnal Tekhnicheskoi Fiziki, 45:19 (2019), 14–16
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Stable multilayer reflective coatings for $\lambda$(HeI) = 58.4 nm for the kortes solar telescope
Pisma v Zhurnal Tekhnicheskoi Fiziki, 45:3 (2019), 26–29
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Comparison of approaches in the manufacture of broadband mirrors for the EUV range: aperiodic and stack structures
Kvantovaya Elektronika, 49:4 (2019), 380–385
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Absolutely calibrated spectrally resolved measurements of Xe laser plasma radiation intensity in the EUV range
Zhurnal Tekhnicheskoi Fiziki, 88:10 (2018), 1554–1558
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Laboratory reflectometer for the investigation of optical elements in a wavelength range of 5 – 50 nm: description and testing results
Kvantovaya Elektronika, 47:4 (2017), 385–392
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Effect of structural defects of aperiodic multilayer mirrors on the properties of reflected (sub)femtosecond pulses
Kvantovaya Elektronika, 47:4 (2017), 378–384
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The diffraction efficiency of echelle gratings increased by ion-beam polishing of groove surfaces
Pisma v Zhurnal Tekhnicheskoi Fiziki, 42:16 (2016), 34–40
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Effect of roughness, deterministic and random errors in film thickness on the reflecting properties of aperiodic mirrors for the EUV range
Kvantovaya Elektronika, 46:5 (2016), 406–413
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X-ray optical system for imaging laser plumes with a spatial resolution of up to 70 nm
Kvantovaya Elektronika, 46:4 (2016), 347–352
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Investigation of supersmooth optical surfaces and multilayer elements using soft X-ray radiation
Zhurnal Tekhnicheskoi Fiziki, 83:9 (2013), 134–142
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Silicon photodiode with selective Zr/Si coating for extreme ultraviolet spectral range
Kvantovaya Elektronika, 42:10 (2012), 943–948
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Precision imaging multilayer optics for soft X-rays and extreme ultraviolet bands
UFN, 182:7 (2012), 727–747
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Multilayer X-ray mirrors based on La/B$_4$C and La/B$_9$C
Zhurnal Tekhnicheskoi Fiziki, 80:8 (2010), 93–100
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New focusing multilayer structures for X-ray and VUV plasma spectroscopy
Zhurnal Tekhnicheskoi Fiziki, 80:7 (2010), 105–110
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Detecting quasi-periodic $\{11n\}$, $n$ = 7–11 faces in samples with Ge/Si quantum dots by grazing X-ray reflectometry
Pisma v Zhurnal Tekhnicheskoi Fiziki, 36:3 (2010), 31–38
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Extreme-ultraviolet source based on the electron-cyclotron-resonance discharge
Pis'ma v Zh. Èksper. Teoret. Fiz., 88:2 (2008), 103–106
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X-ray and vacuum-ultraviolet plasma spectroscopy with the use of new focusing multilayer structures
Pis'ma v Zh. Èksper. Teoret. Fiz., 87:1 (2008), 33–35
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New focusing multilayer structures for X-ray plasma spectroscopy
Kvantovaya Elektronika, 38:2 (2008), 169–171
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Thermal loads of X-ray tubes with a fixed anode under long-duration exposure
TVT, 44:5 (2006), 770–776
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Dispersion elements for X-ray mirror spectrometer on a range of 7–30 nm
Zhurnal Tekhnicheskoi Fiziki, 93:7 (2023), 1002–1008
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Beryllium-based multilayer X-ray optics
UFN, 190:1 (2020), 92–106
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Захарий Фишелевич Красильник (к 70-летию со дня рождения)
Fizika i Tekhnika Poluprovodnikov, 52:2 (2018), 285–286
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Zakharii Fishelevich Krasilnik (on his 70th birthday)
UFN, 188:1 (2018), 119–120
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