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Golubev Sergei Vladimirovich

Publications in Math-Net.Ru

  1. High-density electron cyclotron resonance discharge sustained by gyrotron radiation for intense ion beams generation

    Pisma v Zhurnal Tekhnicheskoi Fiziki, 51:23 (2025),  20–24
  2. Application of dance electron cyclotron discharge plasma for generation of high-current beams of multicharged ions

    Pisma v Zhurnal Tekhnicheskoi Fiziki, 50:24 (2024),  53–55
  3. Neutron beam shaping assembly optimization for the neutron generator at the Institute of Applied Physics of RAS

    Pisma v Zhurnal Tekhnicheskoi Fiziki, 49:24 (2023),  61–65
  4. Application of dense plasma of electron cyclotron resonance discharge for production of positive and negative hydrogen ions

    Pisma v Zhurnal Tekhnicheskoi Fiziki, 49:24 (2023),  35–38
  5. Obtaining the pressure of more than 1 Gbar in solid-state density targets under deceleration of laser-accelerated ions

    Kvantovaya Elektronika, 53:4 (2023),  302–306
  6. Еmittance measurements of a gasdynamic electron cyclotron resonant ion source

    Pisma v Zhurnal Tekhnicheskoi Fiziki, 47:10 (2021),  7–10
  7. Plasma density in discharge sustained in inhomogeneous gas flow by high-power radiation in the terahertz frequency range

    Pisma v Zhurnal Tekhnicheskoi Fiziki, 43:4 (2017),  10–17
  8. An experimental setup for studying the interaction of dense supersonic plasma flows with an arched magnetic field

    Pisma v Zhurnal Tekhnicheskoi Fiziki, 41:18 (2015),  74–81
  9. High-rate growth of InN films on fianite and sapphire substrates by metalorganic vapor phase epitaxy with plasma-assisted nitrogen activation

    Pisma v Zhurnal Tekhnicheskoi Fiziki, 41:6 (2015),  17–25
  10. Production of multiply charged ion beams with an energy of tens of MeV/nucleon by ultrahigh-power laser radiation for nuclear physics problems

    Kvantovaya Elektronika, 43:3 (2013),  217–225
  11. Growing InN films by plasma-assisted metalorganic vapor-phase epitaxy on Al$_2$O$_3$ and YSZ substrates in plasma generated by gyrotron radiation under electron cyclotron resonance conditions

    Pisma v Zhurnal Tekhnicheskoi Fiziki, 38:24 (2012),  86–94
  12. Short-pulse ECR: A source of multiply charged ions

    Zhurnal Tekhnicheskoi Fiziki, 80:12 (2010),  90–94
  13. Production of nanocrystalline silicon layers using the plasma enhanced chemical vapor deposition from the gas phase of silicon tetrafluoride

    Pis'ma v Zh. Èksper. Teoret. Fiz., 89:2 (2009),  80–83
  14. Extreme-ultraviolet source based on the electron-cyclotron-resonance discharge

    Pis'ma v Zh. Èksper. Teoret. Fiz., 88:2 (2008),  103–106
  15. Cyclotron-resonance maser with adiabatic magnetic pumping in a low-density plasma

    Pis'ma v Zh. Èksper. Teoret. Fiz., 86:2 (2007),  98–105
  16. Maser based on cyclotron resonance in a decaying plasma

    Pis'ma v Zh. Èksper. Teoret. Fiz., 84:6 (2006),  375–380
  17. On the possibility of terahertz wave generation upon dense gas optical breakdown

    Pis'ma v Zh. Èksper. Teoret. Fiz., 79:8 (2004),  443–447
  18. NONLINEAR MICROWAVE SUSCEPTIBILITY OF PHOTOIONIZED PLASMA AND DEGENERATED 4-WAVE SHIFTING OF MILLIMETER EMISSION IN IT

    Pisma v Zhurnal Tekhnicheskoi Fiziki, 18:22 (1992),  89–93
  19. Mechanism for instability of a non-self-sustaining microwave discharge in nitrogen

    TVT, 30:6 (1992),  1041–1049
  20. NONEQUILIBRIUM UHF PLASMATRON OF HIGH-PRESSURE

    Zhurnal Tekhnicheskoi Fiziki, 58:2 (1988),  413–416
  21. EXPERIMENTAL-STUDY OF INSTABILITY OF UHF DEPENDENT DISCHARGE

    Zhurnal Tekhnicheskoi Fiziki, 57:1 (1987),  194–195
  22. USE OF DISCHARGE, SUSTAINED BY THE ELECTROMAGNETIC-RADIATION OF THE RANGE OF MILLIMETER WAVES, IN PLASMA CHEMISTRY

    Zhurnal Tekhnicheskoi Fiziki, 54:4 (1984),  723–726
  23. DEPENDENT UHF DISCHARGE IN BEAMS OF ELECTROMAGNET WAVES

    Pisma v Zhurnal Tekhnicheskoi Fiziki, 10:5 (1984),  271–274
  24. Экспериментальное исследование неравновесного СВЧ разряда при атмосферном давлении в воздухе

    Pisma v Zhurnal Tekhnicheskoi Fiziki, 10:3 (1984),  187–190
  25. Ионизирующее излучение СВЧ разряда

    Pisma v Zhurnal Tekhnicheskoi Fiziki, 9:14 (1983),  888–891

  26. Andrei Viktorovich Gaponov-Grekhov (on his eightieth birthday)

    UFN, 176:11 (2006),  1239–1240


© Steklov Math. Inst. of RAS, 2026