Publications in Math-Net.Ru
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Features of resistance, critical temperature and microstructure of cryogenic thin aluminum films
Fizika Tverdogo Tela, 67:7 (2025), 1241–1246
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Thermometers based on NIS junctions of temperature range 1.5–9.0 K
Zhurnal Tekhnicheskoi Fiziki, 95:9 (2025), 1800–1807
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Morphology and electrical parameters of thin aluminum films deposited on substrates at temperatures from 77 to 800 K
Pisma v Zhurnal Tekhnicheskoi Fiziki, 51:4 (2025), 42–45
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Thin aluminum films deposited on liquid nitrogen cooled substrates
Fizika Tverdogo Tela, 66:7 (2024), 1038–1041
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Ultimate parameters of SIS junctions in theory and technological possibilities to achieve them
Fizika Tverdogo Tela, 65:7 (2023), 1140–1147
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