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Publications in Math-Net.Ru
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Peculiarity of reactive magnetron deposition of tantalum oxide films with different methods of gas supply into the chamber
PFMT, 2022, no. 3(52), 97–104
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Generation of a beam plasma by a forevacuum electron source in a space bounded by dielectric walls
Zhurnal Tekhnicheskoi Fiziki, 85:5 (2015), 142–144
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Behavior of an arc discharge in a forevacuum plasma source of electrons
Zhurnal Tekhnicheskoi Fiziki, 85:2 (2015), 55–58
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Specific features of the charge neutralization of silicon carbide in sintering by electron beam in the forevacuum range of pressures
Pisma v Zhurnal Tekhnicheskoi Fiziki, 41:15 (2015), 69–74
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Charge compensation in an insulated target bombarded by a pulsed electron beam in the forevacuum pressure range
Zhurnal Tekhnicheskoi Fiziki, 83:12 (2013), 134–136
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Surface structure of alumina ceramics during irradiation by a pulsed electron beam
Zhurnal Tekhnicheskoi Fiziki, 83:1 (2013), 117–120
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Generating stationary electron beams by a forevacuum plasma source at pressures up to 100 Pa
Pisma v Zhurnal Tekhnicheskoi Fiziki, 39:10 (2013), 9–14
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Potential of a dielectric target during its irradiation by a pulsed electron beam in the forevacuum pressure range
Zhurnal Tekhnicheskoi Fiziki, 82:10 (2012), 103–108
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Expansion of the working range of forevacuum plasma electron sources toward higher pressures
Zhurnal Tekhnicheskoi Fiziki, 82:8 (2012), 62–66
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