Publications in Math-Net.Ru
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Formation of nanodimensional SiO$_{2}$ films on the surface of a free si/cu film system by O$_{2}^{+}$ ion implantation
Zhurnal Tekhnicheskoi Fiziki, 89:6 (2019), 935–937
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Analysis of profiles of atomic distribution over the depth of Si–Me free nanofilm systems
Zhurnal Tekhnicheskoi Fiziki, 85:4 (2015), 123–125
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Effect of the O$_2^+$-ion bombardment on the TiN composition and structure
Zhurnal Tekhnicheskoi Fiziki, 85:2 (2015), 156–158
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Analysis of the structure and properties of heterostructured nanofilms prepared by epitaxy and ion implantation methods
Zhurnal Tekhnicheskoi Fiziki, 83:9 (2013), 146–149
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Optimum ion implantation and annealing conditions for stimulating secondary negative ion emission
Zhurnal Tekhnicheskoi Fiziki, 81:4 (2011), 117–120
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Stimulation of secondary negative ion emission by implantation of alkaline ions into the surface layer of a solid followed by heating
Zhurnal Tekhnicheskoi Fiziki, 80:1 (2010), 110–116
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