Isakhanov Z A

Publications in Math-Net.Ru

1. Study of the critical angle of channeling of active metal ions through thin aluminum films
   
   Pisma v Zhurnal Tekhnicheskoi Fiziki, 47:23 (2021),  12–14
2. The effect of stepwise postimplantation annealing on the composition and structure of silicon surface layers implanted with alkali metal ions
   
   Pisma v Zhurnal Tekhnicheskoi Fiziki, 47:1 (2021),  15–19
3. Modification of the surface properties of free Si–Cu films by implantation of active metal ions
   
   Zhurnal Tekhnicheskoi Fiziki, 90:1 (2020),  123–127
4. Formation of nanodimensional SiO$_{2}$ films on the surface of a free si/cu film system by O$_{2}^{+}$ ion implantation
   
   Zhurnal Tekhnicheskoi Fiziki, 89:6 (2019),  935–937
5. Transmission of electromagnetic waves through thin Cu films
   
   Zhurnal Tekhnicheskoi Fiziki, 86:6 (2016),  156–158
6. Effect of implantation of active metal ions on the elemental and chemical compositions of the CdTe surface
   
   Zhurnal Tekhnicheskoi Fiziki, 85:12 (2015),  146–149
7. Analysis of profiles of atomic distribution over the depth of Si–Me free nanofilm systems
   
   Zhurnal Tekhnicheskoi Fiziki, 85:4 (2015),  123–125
8. Effect of the O$_2^+$-ion bombardment on the TiN composition and structure
   
   Zhurnal Tekhnicheskoi Fiziki, 85:2 (2015),  156–158
9. Energy distribution of metal and noble gas ions traversing single-crystal copper films
   
   Zhurnal Tekhnicheskoi Fiziki, 82:9 (2012),  116–118
10. Optimum ion implantation and annealing conditions for stimulating secondary negative ion emission
    
    Zhurnal Tekhnicheskoi Fiziki, 81:4 (2011),  117–120
11. Stimulation of secondary negative ion emission by implantation of alkaline ions into the surface layer of a solid followed by heating
    
    Zhurnal Tekhnicheskoi Fiziki, 80:1 (2010),  110–116