Lyubimov Aleksandr Ivanovich

Publications in Math-Net.Ru

1. Specific features of matching of a lower electrode and an RF bias generator for reactive ion etching of bulk substrates
   
   Zhurnal Tekhnicheskoi Fiziki, 91:4 (2021),  657–663
2. Influence of the asymmetry of the metal mask arrangement on the matching of the lower electrode with a high-frequency displacement generator during reactive-ion etching of massive substrates
   
   Fizika i Tekhnika Poluprovodnikov, 55:12 (2021),  1255–1259
3. The influence of metal masks on matching of the lower electrode and a high-frequency bias generator at reactive ion etching of large substrates
   
   Pisma v Zhurnal Tekhnicheskoi Fiziki, 47:11 (2021),  44–47