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Publications in Math-Net.Ru
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Leakage current through dielectric in transistors having the channel length up to 100 nm
Fizika i Tekhnika Poluprovodnikov, 56:7 (2022), 693–699
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Silicon metal–oxide–semiconductor transistor with a dependent pocket contact and two-layer polysilicon gate
Fizika i Tekhnika Poluprovodnikov, 55:10 (2021), 916–921
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Prediction of the magnitude of the trapped charge in the buried oxide of silicon-on-insulator structures using the Poole–Frenkel effect
Fizika i Tekhnika Poluprovodnikov, 54:5 (2020), 441–445
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Poole–Frenkel effect and the opportunity of its application for the prediction of radiation charge accumulation in thermal silicon dioxide
Fizika i Tekhnika Poluprovodnikov, 52:9 (2018), 990–994
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Formation of fluorine-containing defects and nanocrystals in SiO$_2$ upon implantation with fluorine, silicon, and germanium ions: Numerical simulation and photoluminescence spectroscopy
Fizika Tverdogo Tela, 57:11 (2015), 2106–2111
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Silicon ion implantation for growing structurally perfect silicon layers on sapphire
Fizika i Tekhnika Poluprovodnikov, 45:12 (2011), 1662–1666
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