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Publications in Math-Net.Ru
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Effect of intermediate layer on the formation and properties of nanostructured ITO films
Pisma v Zhurnal Tekhnicheskoi Fiziki, 51:20 (2025), 50–54
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Characteristics of aluminum oxide deposition on an array of ITO nanowhiskers
Fizika Tverdogo Tela, 66:12 (2024), 2099–2101
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Modified structure of the nanocrystalline ito films
Fizika i Tekhnika Poluprovodnikov, 58:6 (2024), 297–301
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Formation of a light-scattering microrelief during atomic-layer deposition of a dielectric layer on a nanostructured film of indium-tin oxide
Fizika Tverdogo Tela, 65:12 (2023), 2148–2150
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Influence of oxygen on the process of formation of nanostructured films of indium-tin oxide
Fizika Tverdogo Tela, 65:12 (2023), 2079–2082
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Thin-film LED based on AlInGaN layers grown on hybrid SiC/Si substrates
Pisma v Zhurnal Tekhnicheskoi Fiziki, 49:15 (2023), 3–6
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Study of deposition of Al$_2$O$_3$ nanolayers by atomic layer deposition on the structured ito films
Fizika i Tekhnika Poluprovodnikov, 56:8 (2022), 825–830
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ZnO-based antireflection layers obtained by the electron beam evaporation
Fizika i Tekhnika Poluprovodnikov, 55:12 (2021), 1248–1254
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Application of atomic layer deposition for obtaining nanostructured ITO/Al$_{2}$O$_{3}$ coatings
Fizika i Tekhnika Poluprovodnikov, 55:4 (2021), 365–372
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A light-emitting diode based on alingan heterostructures grown on SiC/Si substrates and its fabrication technology
Pisma v Zhurnal Tekhnicheskoi Fiziki, 47:18 (2021), 3–6
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Combination of reactive-ion etching and chemical etching as a method for optimizing the surface relief on AlGaInN heterostructures
Fizika i Tekhnika Poluprovodnikov, 54:10 (2020), 1106–1111
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Modification of the $n$-surface profile of AlGaInN LEDs by changing the gas-mixture composition during reactive ion etching
Fizika i Tekhnika Poluprovodnikov, 54:6 (2020), 564–569
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High-voltage alingan LED chips
Fizika i Tekhnika Poluprovodnikov, 53:11 (2019), 1562–1567
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Nanostructured ITO/SiO$_{2}$ coatings
Fizika i Tekhnika Poluprovodnikov, 53:8 (2019), 1052–1057
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Technique for the formation of antireflection coatings based on ITO films
Fizika i Tekhnika Poluprovodnikov, 53:2 (2019), 181–189
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Study of the effective refractive index profile in self-assembling nanostructured ITO films
Fizika i Tekhnika Poluprovodnikov, 52:10 (2018), 1228–1236
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Technique for forming ITO films with a controlled refractive index
Fizika i Tekhnika Poluprovodnikov, 50:7 (2016), 1001–1006
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Calculation of the optimal architecture of a double-layer ITO film intended for use in reflective contacts in blue and near-UV LEDs
Fizika i Tekhnika Poluprovodnikov, 49:7 (2015), 994–998
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Use of double-layer ITO films in reflective contacts for blue and near-UV LEDs
Fizika i Tekhnika Poluprovodnikov, 48:12 (2014), 1713–1718
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High-power AlGaInN LED chips with two-level metallization
Fizika i Tekhnika Poluprovodnikov, 48:9 (2014), 1287–1293
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Optimization of the deposition technique of thin ITO films used as transparent conducting contacts for blue and near-UV LEDs
Fizika i Tekhnika Poluprovodnikov, 48:1 (2014), 61–66
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Comparison of the properties of AlGaInN light-emitting diode chips of vertical and flip-chip design using silicon as the a submount
Fizika i Tekhnika Poluprovodnikov, 47:3 (2013), 386–391
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AlGaInN-based light emitting diodes with a transparent $p$-contact based on thin ITO films
Fizika i Tekhnika Poluprovodnikov, 46:3 (2012), 384–388
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Effect of the silicon doping level and features of nanostructural arrangement on decrease in external quantum efficiency in InGaN/GaN light-emitting diodes with increasing current
Fizika i Tekhnika Poluprovodnikov, 45:3 (2011), 425–431
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Raising the quantum efficiency of AlGaInN flip-chip LEDs by Reactive ion etching of the outer side of SiC substrates
Fizika i Tekhnika Poluprovodnikov, 44:5 (2010), 684–687
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