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Demakov Konstantin Dmitrievich

Publications in Math-Net.Ru

  1. On the generation of charge-carrier recombination centers in the sapphire substrates of silicon-on-sapphire structures

    Fizika i Tekhnika Poluprovodnikov, 49:8 (2015),  1124–1128
  2. Recrystallization of silicon-on-sapphire structures at various amorphization-ion-beam energies

    Fizika i Tekhnika Poluprovodnikov, 47:2 (2013),  264–266
  3. Crystalline quality improvement in silicon films on sapphire using recrystallization from the silicon-sapphire interface

    Fizika i Tekhnika Poluprovodnikov, 44:10 (2010),  1433–1435
  4. Высокотемпературная ионная имплантация мышьяка в кремний

    Fizika i Tekhnika Poluprovodnikov, 24:6 (1990),  1132–1133
  5. SYNTHESIS OF SI3N4 AMORPHOUS FILMS DURING NITROGEN ION-IMPLANTATION TO SILICON

    Pisma v Zhurnal Tekhnicheskoi Fiziki, 16:23 (1990),  43–45
  6. Исследование распределения аморфной и кристаллической фазы ионно-синтезированного SiC в Si

    Fizika i Tekhnika Poluprovodnikov, 22:4 (1988),  731–732
  7. Electric Properties of $p{-}n{-}n^{+}$ Structure in Silicon Carbide Produced by Ionic Doping of Aluminum

    Fizika i Tekhnika Poluprovodnikov, 21:9 (1987),  1685–1689
  8. Study of the Formation of $\beta$-SiC Monocrystalline Layers on Si by the Method of Highly Intense Ionic Doping

    Fizika i Tekhnika Poluprovodnikov, 21:5 (1987),  920–922
  9. Synthesis of Monocrystalline Silicon Carbide by Single-Step Equipment of Highly Intense Ion Doping

    Fizika i Tekhnika Poluprovodnikov, 20:1 (1986),  149–152
  10. Vibration structure of $D_{1}$-spectra in cubic $\mathrm{SiC}$

    Fizika Tverdogo Tela, 27:10 (1985),  3170–3172
  11. $\mathrm{SiC}$ layer structure reduction after ion implantation

    Fizika Tverdogo Tela, 26:5 (1984),  1575–1577
  12. Cathodoluminescence of SiC Ion-Doped by Aland Ar

    Fizika i Tekhnika Poluprovodnikov, 18:4 (1984),  700–703
  13. The effect of channelling on the distribution of electrically active boron and phosphorus atoms intruded into silicon single crystals

    Dokl. Akad. Nauk SSSR, 197:2 (1971),  319–322


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