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Zavadski Sergei Mikhailovich

Publications in Math-Net.Ru

  1. Influence of the method of gas supply to the chamber on the processes of reactive magnetron sputtering of Ti–Al composite target

    Zhurnal Tekhnicheskoi Fiziki, 93:3 (2023),  409–416
  2. Influence of aluminum doping degree on the properties of titanium-aluminum oxide films

    PFMT, 2023, no. 2(55),  74–82
  3. Peculiarity of reactive magnetron deposition of tantalum oxide films with different methods of gas supply into the chamber

    PFMT, 2022, no. 3(52),  97–104
  4. Structure and mechanical properties of silicon-carbon coatings alloyed with chromium

    PFMT, 2022, no. 2(51),  52–57
  5. Ferroelectric properties of strontium-bismuth tantalate thin film deposited by RF magnetron sputtering method

    PFMT, 2018, no. 1(34),  33–37
  6. Ferroelectric properties of niobium-doped strontium bismuth tantalate films

    Fizika Tverdogo Tela, 58:1 (2016),  51–55
  7. Formation of titanium nitride films by reactive magnetron sputtering under low pressure

    PFMT, 2016, no. 2(27),  12–17
  8. Joint functioning of a magnetron sputtering system and an end-Hall ion source

    Zhurnal Tekhnicheskoi Fiziki, 84:9 (2014),  66–73
  9. On the sol–gel synthesis of strontium-titanate thin films and the prospects of their use in electronics

    Fizika i Tekhnika Poluprovodnikov, 48:12 (2014),  1724–1726
  10. Electrical and optical properties of zinc-oxide films deposited by the ion-beam sputtering of an oxide target

    Fizika i Tekhnika Poluprovodnikov, 48:9 (2014),  1274–1279


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