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Publications in Math-Net.Ru
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Influence of the method of gas supply to the chamber on the processes of reactive magnetron sputtering of Ti–Al composite target
Zhurnal Tekhnicheskoi Fiziki, 93:3 (2023), 409–416
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Influence of aluminum doping degree on the properties of titanium-aluminum oxide films
PFMT, 2023, no. 2(55), 74–82
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Peculiarity of reactive magnetron deposition of tantalum oxide films with different methods of gas supply into the chamber
PFMT, 2022, no. 3(52), 97–104
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Structure and mechanical properties of silicon-carbon coatings alloyed with chromium
PFMT, 2022, no. 2(51), 52–57
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Ferroelectric properties of strontium-bismuth tantalate thin film deposited by RF magnetron sputtering method
PFMT, 2018, no. 1(34), 33–37
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Ferroelectric properties of niobium-doped strontium bismuth tantalate films
Fizika Tverdogo Tela, 58:1 (2016), 51–55
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Formation of titanium nitride films by reactive magnetron sputtering under low pressure
PFMT, 2016, no. 2(27), 12–17
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Joint functioning of a magnetron sputtering system and an end-Hall ion source
Zhurnal Tekhnicheskoi Fiziki, 84:9 (2014), 66–73
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On the sol–gel synthesis of strontium-titanate thin films and the prospects of their use in electronics
Fizika i Tekhnika Poluprovodnikov, 48:12 (2014), 1724–1726
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Electrical and optical properties of zinc-oxide films deposited by the ion-beam sputtering of an oxide target
Fizika i Tekhnika Poluprovodnikov, 48:9 (2014), 1274–1279
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