This article is cited in 54 papers

CONFERENCES AND SYMPOSIA

Beryllium-based multilayer X-ray optics

V. N. Polkovnikov, N. N. Salashchenko, M. V. Svechnikov, N. I. Chkhalo

Institute for Physics of Microstructures, Russian Academy of Sciences, Nizhny Novgorod

Abstract: The article provides a review of the current state of affairs in the field of physics and technology of multilayer beryllium-containing mirrors intended for projection lithography and solar corona studies in the extreme ultraviolet (EUV) region. The methods of synthesizing and studying beryllium-containing multilayer mirrors are described. The results of recent studies on the internal structure and EUV reflection coefficients are given for Mo/Be, Mo/Si, Be/Al, and Be/Mg multilayer mirrors. The effect of Si and Be interlayers on the reflectivity is explained. Avenues for further research on beryllium-containing mirrors are discussed.

Keywords: multilayer X-ray mirror, X-ray projection photolithography, microscopy, astronomy, spectroscopy, reflectometry, magnetron sputtering, nanofilm synthesis, beryllium, reflectance, interlayer.

PACS: 07.60.-j, 07.85.Fv, 42.79.-e, 68.35.Ct, 68.35.Fx, 68.47.De, 68.55.A-, 68.65.Ac, 81.15.-z

Received: July 18, 2019
Accepted: May 22, 2019

DOI: 10.3367/UFNr.2019.05.038623

 English version: Physics–Uspekhi, 2020, 63:1, 83–95

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