Abstract:
The focusing of optical energy on a nanosize spatial domain in the vicinity of the nanoapex of a metal microtip is studied. This focus occurs under the symmetric convergence of the surface plasmon wave to the nanoapex. The metal microtip surface is approximated by the paraboloid of revolution. The focal field distribution near the nanoapex is studied with scanning of the surface of a multilayer thin-film structure. The numerical method for the obtainment of the focal field distribution is considered. The application of the presented method to the technologies for the creation of stamps and molds for ultraviolet nanolithography is discussed.