Abstract:
Results of studies on application of broadband radiation of gas-discharge lamps for activation of solid-phase processes including the synthesis of thin films, nanocrystallization of amorphous structures, recrystallization and modification of thin films formed by various methods are analyzed and generalized. Compared to conventional thermal processing, the effect of photon treatment manifests itself in acceleration of processes, higher degree of dispersion of structures formed and in reduction of temperature thresholds for the phase formation. Prospects for application of photon activation in technological processes are discussed. The bibliography includes 142 references.
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