This article is cited in 13 papers

Special issue devoted to the 80th anniversary of academician N. G. Basov's birth

A capillary discharge plasma source of intense VUV radiation

I. I. Sobel'man^a, A. P. Shevel'ko^a, O. F. Yakushev^a, L. V. Knight^b, R. S. Turley<sup>b

a</sup> P. N. Lebedev Physical Institute, Russian Academy of Sciences, Moscow
^b Brigham Young University, USA

Abstract: The results of investigation of a capillary discharge plasma, used as a source of intense VUV radiation and soft X-rays, are presented. The plasma was generated during the discharge of low-inductance condensers in a gas-filled ceramic capillary. Intense line radiation was observed in a broad spectral range (30-400 Å) in various gases (CO₂, Ne, Ar, Kr, Xe). The absolute radiation yield for the xenon discharge was ~5 mJ (2π sr)^-1 pulse^-1 within a spectral band of width 9 Å at 135 Å. Such a radiation source can be used for various practical applications, such as EUV projection lithography, microscopy of biological objects in a 'water window', reflectometry, etc.

PACS: 52.25.Os, 52.50.Nr, 42.72.Bj

Received: 17.06.2002

 English version: Quantum Electronics, 2003, 33:1, 3–6

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