I. A. Artyukov, “Optical and X-ray microlithography at the turn of the century”, Kvantovaya Elektronika, 2022, Volume 52, Number 12,Pages <nobr>1094

This article is cited in 2 papers

Special issue dedicated to the 100th anniversary of the birth of N.G.Basov

Optical and X-ray microlithography at the turn of the century

I. A. Artyukov

P. N. Lebedev Physical Institute of the Russian Academy of Sciences, Moscow

Abstract: The paper reviews the development of optical lithography based on excimer laser and soft X-ray projection lithography at the end of the 20th century and at the beginning of the 21th century. The contribution of N.G. Basov and his colleagues in this field at FIAN and MEPhI is described.

Keywords: optical lithography, soft X-ray projection lithography, soft X-rays, X-ray multilayer optics, EUV lithography.

PACS: 41.50.+h

Received: 16.09.2022
Revised: 08.12.2022