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JOURNALS // Kvantovaya Elektronika // Archive

Kvantovaya Elektronika, 2013 Volume 43, Number 12, Pages 1170–1174 (Mi qe15194)

This article is cited in 4 papers

Laser deposition of thin films

A simple solution to the problem of effective utilisation of the target material for pulsed laser deposition of thin films

A. S. Kuzanyana, A. A. Kuzanyana, V. A. Petrosyana, S. Kh. Pilosyanb, A. Z. Grasyukb

a Institute for Physical Research, National Academy of Sciences of Armenia, Ashtarak
b P. N. Lebedev Physical Institute, Russian Academy of Sciences, Moscow

Abstract: The factors determining the efficiency of the target material utilisation for pulsed laser deposition of films are considered. The target volume is calculated, which is evaporated in the ablation process by the focused laser radiation having a rectangular form. The new device is suggested and developed for obtaining thin films by the method of laser deposition, which is specific in the employment of a simple optical system mounted outside a deposition chamber that comprises two lenses and the diaphragm and focuses the laser beam onto a target in the form of a sector-like spot. Thin films of CuO and YBaCuO were deposited with this device. Several deposition cycles revealed that the target material is consumed uniformly from the entire surface of the target. A maximal spread of the target thickness was not greater than ±2% both prior to deposition and after it. The device designed provides a high coefficient of the target material utilisation efficiency.

Keywords: pulsed laser deposition, laser beam, focal spot, target.

PACS: 81.15.Fq

Received: 31.03.2013
Revised: 01.11.2013


 English version:
Quantum Electronics, 2013, 43:12, 1170–1174

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