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JOURNALS // Kvantovaya Elektronika // Archive

Kvantovaya Elektronika, 2010 Volume 40, Number 12, Pages 1141–1145 (Mi qe13990)

This article is cited in 5 papers

Interferometry

High-sensitive interferometric control of the quality of diffractive elements

A. M. Lyalikov

Yanka Kupala State University of Grodno

Abstract: The prospects of the long lateral shear interferometry for controlling the quality of diffractive elements are shown. In this case, use is made of two diffractive elements, one of which is under investigation, and the other is the model one. A universal device is proposed to control the quality of the diffractive elements of both transmission and reflection types. We present the results of experimental realisation of the technique for the quality control of production of two-dimensional amplitude masks and reflection diffraction gratings.

PACS: 42.87.Bg, 42.79.Dj

Received: 21.10.2008
Revised: 12.10.2010


 English version:
Quantum Electronics, 2010, 40:12, 1141–1145

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© Steklov Math. Inst. of RAS, 2026