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JOURNALS // Kvantovaya Elektronika // Archive

Kvantovaya Elektronika, 1998 Volume 25, Number 4, Pages 291–292 (Mi qe1212)

This article is cited in 8 papers

Letters to the editor

Laser-plasma synthesis of diamond films

V. I. Konov, S. A. Uglov

Prokhorov General Physics Institute of the Russian Academy of Sciences, Moscow

Abstract: A novel technique for plasma synthesis of diamond films (and in future of other materials) with the aid of a stationary optical discharge in flowing mixtures of reactant gases was proposed and experimentally implemented. The use of a cw CO2 laser of 2.5 kW power acting on an Xe — H2 — CH4 gaseous mixture, in an atmospheric-pressure reactor developed for the purpose, made it possible to achieve diamond film deposition rates of 30 — 50 μm h–1 on an area of 1 cm2. The characteristic features and advantages of this laser-plasma deposition technique are discussed.

PACS: 81.15.Fg, 81.15.Gh, 42.62.Cf

Received: 27.01.1998


 English version:
Quantum Electronics, 1998, 28:4, 281–282

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