A. I. Safonov, V. S. Sulyaeva, A. L. Bogoslovtseva, N. I. Timoshenko, “Effect of the flow rate of the precursor gas on the growth rate of a fluoropolymer coating during hot wire chemical vapor deposition”, Prikl. Mekh. Tekh. Fiz., 2018, Volume 59, Issue 5,Pages <nobr>87

This article is cited in 3 papers

Effect of the flow rate of the precursor gas on the growth rate of a fluoropolymer coating during hot wire chemical vapor deposition

A. I. Safonov^a, V. S. Sulyaeva^b, A. L. Bogoslovtseva^a, N. I. Timoshenko^a

^a S.S. Kutateladze Institute of Thermophysics, Siberian Division of the Russian Academy of Sciences, Novosibirsk, 630090, Russia
^b Nikolaev Institute of Inorganic Chemistry, Siberian Branch, Russian Academy of Sciences, Novosibirsk, 630090, Russia

Abstract: The formation of a fluoropolymer coating by chemical deposition has been studied. It has been found that increasing the flow rate of the precursor gas leads to a decrease in the growth rate of the coating. The conditions deposition was analyzed, and the gas dynamic parameters of the process were estimated. It is shown that the estimates are consistent with experimental data.

Keywords: fluoropolymer, thin films, HWCVD method, gas dynamic flow regime, catalyst.

UDC: 533.17: 541.64

Received: 28.06.2018

DOI: 10.15372/PMTF20180510