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JOURNALS // Prikladnaya Mekhanika i Tekhnicheskaya Fizika // Archive

Prikl. Mekh. Tekh. Fiz., 1992 Volume 33, Issue 3, Pages 3–7 (Mi pmtf4077)

Stability of thin silicon targets exposed to a high-flux beam of relativistic electrons

B. R. Meshcherov, V. I. Tumanov

Moscow

UDC: 538.97

Received: 05.09.1990
Revised: 04.04.1991


 English version:
Journal of Applied Mechanics and Technical Physics, 1992, 33:3, 309–312


© Steklov Math. Inst. of RAS, 2026