Abstract:
A method of separating porous silicon (por-Si) layer without deformation from a silicon substrate, which virtually excludes almost any risk of subsequent degradation of the isolated por-Si layer is proposed. The current-voltage characteristics of por-Si have been measured in a temperature interval of 300–255 K. Direct measurements of the conductivity of por-Si have been performed for the first time and it is established that the conductivity has an activation nature for the current passage parallel to the por-Si sample surface.