This article is cited in 10 papers

Effect of heat treatment on the structure of titanium dioxide films

A. E. Komlev^ab, A. E. Lapshin^ab, O. V. Magdysyuk^ab, V. V. Plotnikov^ab, V. I. Shapovalov^ab, N. S. Shutova<sup>ab

a</sup> Saint Petersburg Electrotechnical University "LETI"
^b I. V. Grebenshchikov Institute of Silicate Chemistry of the Russian Academy of Sciences, St. Petersburg

Abstract: The development of nanocrystalline phases during isothermal annealing of titanium dioxide films deposited by reactive magnetron sputtering at various rates onto silica glass substrates has been studied. It is established that the heat treatment at temperatures within 500–700$^\circ$C in air or in vacuum leads to significantly different results, depending on the initial crystalline structure of as-deposited films.

Received: 29.03.2010

 English version: Technical Physics Letters, 2010, 36:10, 942–944

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