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Pisma v Zhurnal Tekhnicheskoi Fiziki, 2010 Volume 36, Issue 15, Pages 14–21 (Mi pjtf9574)

This article is cited in 10 papers

Studying defect structure of GaN epilayers by means of three-beam X-ray diffraction analysis

R. N. Kyutt

Ioffe Institute, St. Petersburg

Abstract: X-ray multiple diffraction in epitaxial films of GaN with various densities of dislocations has been measured using Renninger scans for a primary forbidden (0001) reflection. The angular widths of three-beam diffraction peaks measured in both $\varphi$ scans (rotation about the normal to the sample surface) and $\theta$ scans (rotation about the Bragg angle) have been analyzed. It is established that the three-beam Renninger diffraction peaks exhibit splitting due to a large-block structure of epilayers. For some three-beam combinations, the half-width (FWHM) of $\theta$ scan peaks is highly sensitive to the dislocation density.

Received: 25.02.2010


 English version:
Technical Physics Letters, 2010, 36:8, 690–693

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© Steklov Math. Inst. of RAS, 2026