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Pisma v Zhurnal Tekhnicheskoi Fiziki, 2010 Volume 36, Issue 3, Pages 45–52 (Mi pjtf9411)

This article is cited in 1 paper

Growth and properties of single crystals of Si$_{1-x}$Ge$_x$(0 $<x<$ 0.35) solid solutions

I. G. Atabaevabc, N. A. Matchanovabc, M. U. Khazhievabc, Sh. A. Yusupovaabc

a Physical-Technical Institute, Uzbekistan Academy of Sciences
b Department of Electrical and Computer Engineering, Michigan State University, East Lansing, USA
c Ioffe Institute, St. Petersburg

Abstract: Single-crystalline Si$_{1-x}$Ge$_x$ ingots with a germanium content of up to 35 at.%, a diameter of 10mm, and a length of up to 10 cm were grown using the crucibleless float-zone melting technique. The ingots had a homogeneous distribution of germanium and a low density of dislocations. The material was characterized with respect to the structure and electrical properties. The resistivity and the carrier lifetime, mobility, and concentration in Si$_{1-x}$Ge$_x$ single crystals have been studied as functions of the germanium content.

Received: 21.09.2009


 English version:
Technical Physics Letters, 2010, 36:2, 115–118

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© Steklov Math. Inst. of RAS, 2026