Production of coating based on high-entropy carbide in arc discharge plasma

D. S. Nikitin^a, I. I. Shanenkov^a, A. Nasyrbaev^a, A. A. Sivkov^a, A. G. Kvashnin^b, A. Ya. Pak<sup>a

a</sup> Tomsk Polytechnic University
^b Skolkovo Institute of Science and Technology

Abstract: The coating based on high-entropy carbide was synthesized using a coaxial magnetoplasma accelerator to generate a high-speed arc discharge plasma. The plasma was used to deposit the coating on a copper substrate under the appropriate conditions. During the plasma dynamic synthesis process, a stable compound with a cubic Fm3m structure, TiZrNbHfTaC$_5$, was formed without any impurities. This compound has a sufficiently dense and homogeneous structure (porosity $\sim$7%) with a thickness of $\sim$20 $\mu$m. The resulting coating exhibits increased physical and mechanical properties, including a nanohardness of $\sim$32 GPa and a Young's modulus of $\sim$303 GPa. These values make the material promising for the production of hardened, wear-resistant, and heat-protective products.

Keywords: plasma, arc discharge, high entropy carbide, coating.

Received: 01.07.2025
Revised: 11.09.2025
Accepted: 16.09.2025

DOI: 10.61011/PJTF.2026.02.62069.20423

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