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Pisma v Zhurnal Tekhnicheskoi Fiziki, 2011 Volume 37, Issue 19, Pages 80–87 (Mi pjtf9296)

This article is cited in 12 papers

Lead selenide nanowire growth by vapor-liquid-solid mechanism under mask during plasma processing

S. P. Ziminab, E. S. Gorlachevab, I. I. Amirovab, V. V. Naumovab

a P.G. Demidov Yaroslavl State University
b Yaroslavl branch of the Institute of physics and technology, Institution of Russian academy of sciences

Abstract: Data on the formation of lead selenide (PbSe) nanowires under a stencil mask during the processing of epitaxial PbSe films in high-density inductively coupled plasma (ICP) of low-pressure argon RF discharge are presented. The nanowires were studied by high-resolution scanning electron microscopy and energy-dispersive X-ray spectroscopy. A physical model is proposed that explains the local formation of PbSe nanowires in terms of their catalytic growth according to the vapor-liquid-solid mechanism.

Received: 04.05.2011


 English version:
Technical Physics Letters, 2011, 37:10, 929–931

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