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Pisma v Zhurnal Tekhnicheskoi Fiziki, 2011 Volume 37, Issue 9, Pages 105–110 (Mi pjtf9162)

Electron irradiation controlled profile of recombination center concentration in silicon

I. V. Grekhovab, L. S. Kostinaab, V. V. Kozlovskyab, V. N. Lomasovab, A. V. Rozhkovab

a Ioffe Institute, St. Petersburg
b St. Petersburg Polytechnic University

Abstract: It is shown that the axial distribution of the recombination center concentration in high-voltage silicon $p^+Nn^+$ diodes can be controlled by electron irradiation in a certain energy range. Results of investigations of the main static and dynamic characteristics of electron-irradiated diodes are presented.

Received: 13.12.2010


 English version:
Technical Physics Letters, 2011, 37:5, 442–444

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