This article is cited in 6 papers

Plasmachemical synthesis of aluminum-based nitride compounds in vacuum-arc discharge plasma

Yu. A. Bystrov^abc, N. Z. Vetrov^abc, A. A. Lisenkov<sup>abc

a</sup> Saint Petersburg Electrotechnical University "LETI"
^b SED-SPb Company, St. Petersburg
^c Institute of Problems of Mechanical Engineering, Russian Academy of Sciences, St. Petersburg

Abstract: A vacuum-arc plasmachemical synthesis of aluminum-based nitride compounds (AlN and Ti–Al–N) is described. The compositions and structures of the obtained coatings have been studied. It is shown that the composition and structure of a coating can be effectively controlled by varying the discharge current, ion current density distribution, and gas pressure, provided that the plasma flow is free of droplets.

Received: 14.06.2012

 English version: Technical Physics Letters, 2012, 38:10, 938–940

Bibliographic databases:

•