Abstract:
The effect of the temperature mode of 4-MeV electron irradiation on the change in the basic electrophysical characteristics of silicon diffused $p^+$–$n$–$n^+$ structures has been studied. It has been shown that the temperature of the crystal and integrated intensity during irradiation have a significant effect on the parameters of formation of radiation defects and the pattern of their distribution in different regions of silicon $p^+$–$n$–$n^+$ structures.