Abstract:
A lithographic method of obtaining metal nanowires and nanoparticles on solid substrates is proposed, which employs a polymer mask with windows for the metal deposition formed by indentation in an atomic force microscope. Using this method, Ni nanowires with a minimum width of 60 nm, thicknesses within 6–20 nm, and lengths up to 20 $\mu$m and Ni nanoparticles with a preset ordered arrangement have been obtained on a SiO$_2$ surface. The domain structure in obtained nanoobjects has been studied by the magnetic force microscopy technique.