N. M. Suleimanov, A. A. Abdullina, V. V. Bazarov, N. M. Lyadov, N. R. Khanov, V. A. Shustov, “Synthesis and characterization of Ge$_x$Ni$_{1-x}$ composite films obtained by deposition of germanium and nickel”, Pisma v Zhurnal Tekhnicheskoi Fiziki, 2026, Volume 52, Issue 1,Pages 41

Synthesis and characterization of Ge$_x$Ni$_{1-x}$ composite films obtained by deposition of germanium and nickel

N. M. Suleimanov^a, A. A. Abdullina^b, V. V. Bazarov^a, N. M. Lyadov^a, N. R. Khanov^ab, V. A. Shustov^a

^a Zavoisky Physical Technical Institute, Kazan Scientific Center of the Russian Academy of Sciences
^b Kazan State Power Engineering University

Abstract: A series of Ge$_x$Ni$_{1-x}$ films were synthesized on single-crystal silicon substrates using direct-current magnetron sputtering in a high-vacuum chamber. The films were produced by simultaneous sputtering of two targets: semiconductor germanium and metallic nickel. The chemical composition of the films was studied by X-ray photoelectron spectroscopy. It has been established that thermal annealing of films leads to the formation of a nickel germanide (NiGe) phase. Scanning electron microscopy has revealed areas that can be attributed to this phase.

Keywords: electrode materials, metal nanoparticles, electrocatalytic activity, semiconductor nanostructured systems.

Received: 04.07.2025
Revised: 20.08.2025
Accepted: 01.09.2025

DOI: 10.61011/PJTF.2026.01.61920.20433