This article is cited in 14 papers

Roughness of amorphous, polycrystalline and hemispherical-grained silicon films

A. V. Novak^ab, V. R. Novak<sup>ab

a</sup> National Research University of Electronic Technology
^b State Research Institute of Physical Problems

Abstract: We have performed atomic-force-microscopy studies of the roughness and spatial and correlation properties of the surface for three typical LPCVD films of silicon: amorphous and polycrystalline films with a relatively smooth surface, as well as polycrystalline films with hemispherical grains (HSG-Si) having considerable surface roughness. As follows from analysis of the correlation function and power spectral density function, the model of a self-affine surface is suitable for describing morphology of amorphous and polycrystalline silicon films, while the model of a mounded surface is preferable for HSG-Si films.

Received: 14.05.2013

 English version: Technical Physics Letters, 2013, 39:10, 858–861

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