Features of surface structuring of silicon (100) crystals by microwave plasma treatment in different gas environments

V. Ya. Shanygin, R. K. Yafarov

Saratov Branch, Kotel'nikov Institute of Radio-Engineering and Electronics, Russian Academy of Sciences

Abstract: The laws of the effect of microwave plasma treatment modes on the surface nanomorphology of silicon single crystals with crystallographic orientation (100) with a natural oxide coating are studied. Model mechanisms of surface nanostructuring during plasma treatment in gas environments with different selectivities for the heterostructure material of the substrate are discussed.

Received: 29.05.2012

 English version: Technical Physics Letters, 2013, 39:5, 405–408

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