The texture of thin films of aluminum nitride obtained by magnetron sputtering

V. I. Strunin^ab, L. V. Baranova^ab, B. T. Baisova<sup>ab

a</sup> Omsk State University
^b Institute of Radiophysics and Physical Electronics, Omsk Scientific Center of the Siberian Branch of the RAS

Abstract: The results of a study of the texture of thin films of aluminum nitride obtained by magnetron sputtering are presented. The dependence of the size and degree of preferential orientation of crystallites on the conditions of formation of thin films (pressure, discharge power, composition of the plasma-forming gas) is investigated.

Keywords: aluminum nitride films, magnetron sputtering, texture, size of the coherent scattering region.

Received: 06.05.2025
Revised: 16.06.2025
Accepted: 17.07.2025

DOI: 10.61011/PJTF.2025.20.61402.20368

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