R. K. Yafarov, V. Ya. Shanygin, “Formation of carbon subnanosize masking coatings on silicon (100) in low-pressure microwave plasma”, Pisma v Zhurnal Tekhnicheskoi Fiziki, 2014, Volume 40, Issue 7,Pages <nobr>8

This article is cited in 4 papers

Formation of carbon subnanosize masking coatings on silicon (100) in low-pressure microwave plasma

R. K. Yafarov, V. Ya. Shanygin

Saratov Branch, Kotel'nikov Institute of Radio-Engineering and Electronics, Russian Academy of Sciences

Abstract: Self-organization of nanosize domains in deposition of submonolayer carbon coatings on silicon (100) in a low-pressure microwave plasma has been revealed by scanning atomic-force and electron microscopy. It is shown that the nanosize carbon-containing domains can be used as masking coatings to obtain 3D low-dimensional systems on single-crystal silicon (100) by highly anisotropic plasma-chemical etching.

Received: 01.11.2013